Plasma Technology Applied to Improve Wettability for Emerging Mycelium-Based Materials
Round 1
Reviewer 1 Report
Comments and Suggestions for AuthorsSee attached.
Comments for author File: Comments.pdf
Comments on the Quality of English LanguageThe English language must be improved.
Author Response
Please see the attachment
Author Response File: Author Response.pdf
Reviewer 2 Report
Comments and Suggestions for AuthorsI have read your paper "Plasma technology applied to improve wettability for emerging 2 mycelium-based materials" which has been submitted to Processes Journal. The article is original and interesting. However, some suggestions and questions are necessary, which are presents below:
1. A figure showing the plasma equipment is important to explain, mainly, the configuration of the four trays and 5 planar electrodes.
2. In the water absorption, what flow time was considered in this case?
3. It's not necessary to explain details of the SEM. These configurations exist in all electron microscopes, and there is no need for detail. Just state the operating conditions of this work.
4. In figure 3, the thichness decrease for untreated sample. Please to correct
5. From line 318 to line 321: The peak at 293 eV could be due to different oxidation states. You here pointed out a state of potassium K2s, why? Is there any evidence of potassium in your material? Which?
Author Response
Please see the attachment
Author Response File: Author Response.pdf
Round 2
Reviewer 1 Report
Comments and Suggestions for AuthorsThe authors answer all my questions.
Comments on the Quality of English LanguageThe English is OK
Author Response
Thank you for your time and suggestions.