Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer
AbstractThere are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10–8 V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 105 V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment.
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Lai, J.-L.; Liao, C.-J.; Su, G.-D.J. Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer. Sensors 2012, 12, 16390-16403.
Lai J-L, Liao C-J, Su G-DJ. Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer. Sensors. 2012; 12(12):16390-16403.Chicago/Turabian Style
Lai, Jian-Lun; Liao, Chien-Jen; Su, Guo-Dung J. 2012. "Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer." Sensors 12, no. 12: 16390-16403.