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Micromachines 2013, 4(2), 232-242; doi:10.3390/mi4020232

Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow

Department of Micro-Nano Systems Engineering, Nagoya University, Nagoya 464-8603, Japan
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Received: 19 March 2013 / Revised: 12 May 2013 / Accepted: 23 May 2013 / Published: 5 June 2013
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Abstract

This paper presents a novel method for fabricating nanopillar micropatterns for surface-directed liquid flows. It employs hybrid mask lithography, which uses a mask consisting of a combination of a photoresist and nanoparticles in the photolithography process. The nanopillar density is controlled by varying the weight ratio of nanoparticles in the composite mask. Hybrid mask lithography was used to fabricate a surface-directed liquid flow. The effect of the surface-directed liquid flow, which was formed by the air-liquid interface due to nanopillar micropatterns, was evaluated, and the results show that the oscillation of microparticles, when the micro-tool was actuated, was dramatically reduced by using a surface-directed liquid flow. Moreover, the target particle was manipulated individually without non-oscillating ambient particles. View Full-Text
Keywords: nanopillar; lithography; microrobot; surface-directed liquid flow; microfluidic chip nanopillar; lithography; microrobot; surface-directed liquid flow; microfluidic chip
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Sakuma, S.; Sugita, M.; Arai, F. Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for Surface-Directed Liquid Flow. Micromachines 2013, 4, 232-242.

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