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Micromachines 2013, 4(4), 370-377; doi:10.3390/mi4040370

Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography

1
Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), Lausanne 1015, Switzerland
2
Institute of Physics, University of Basel, Klingelbergstrasse 82, Basel CH-4056, Switzerland
*
Author to whom correspondence should be addressed.
Received: 5 May 2013 / Revised: 27 July 2013 / Accepted: 10 October 2013 / Published: 15 October 2013
(This article belongs to the Special Issue Micromachined Tools for Nanoscale Science and Technology)
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Abstract

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the stamps reproduce the membrane aperture patterns within ±10 nm and we validate such stamps by using them to fabricate metallic nanowires down to 100 nm in size.
Keywords: nanostencil lithography; nanoimprint lithography; nanowires nanostencil lithography; nanoimprint lithography; nanowires
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Villanueva, L.G.; Vazquez-Mena, O.; Martin-Olmos, C.; Savu, V.; Sidler, K.; Brugger, J. Resistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography. Micromachines 2013, 4, 370-377.

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