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Nanomaterials 2012, 2(3), 251-267; doi:10.3390/nano2030251

Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study

1
Sol-Gel Centre for Research on Inorganic Powders and Thin Film Synthesis SCRiPTS, Department of Inorganic and Physical Chemistry, Ghent University, Krijgslaan 281-S3, Gent B-9000, Belgium
2
IFW Dresden, Helmholtzstrasse 20, Dresden 01069, Germany
*
Author to whom correspondence should be addressed.
Received: 31 May 2012 / Revised: 17 July 2012 / Accepted: 25 July 2012 / Published: 9 August 2012
(This article belongs to the Special Issue New Developments in Nanomaterial Analysis)
View Full-Text   |   Download PDF [932 KB, 14 August 2012; original version 9 August 2012]   |  

Abstract

This work describes various combinations of cleaning methods involved in the preparation of Ni-5% W substrates for the deposition of buffer layers using water-based solvents. The substrate has been studied for its surface properties using X-ray photoelectron spectroscopy (XPS). The contaminants in the substrates have been quantified and the appropriate cleaning method was chosen in terms of contaminants level and showing good surface crystallinity to further consider them for depositing chemical solution-based buffer layers for Y1Ba2Cu3Oy (YBCO) coated conductors. View Full-Text
Keywords: X-ray photoelectron spectroscopy; cleaning of Ni-5% W substrate; depth profile studies; thin films and coatings X-ray photoelectron spectroscopy; cleaning of Ni-5% W substrate; depth profile studies; thin films and coatings
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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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Narayanan, V.; Bruneel, E.; Hühne, R.; Van Driessche, I. Effects of Varied Cleaning Methods on Ni-5% W Substrate for Dip-Coating of Water-based Buffer Layers: An X-ray Photoelectron Spectroscopy Study. Nanomaterials 2012, 2, 251-267.

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