Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings
Abstract
:1. Introduction
2. Materials and Methods
3. Results and Discussion
4. Conclusions
Acknowledgments
Author Contributions
Conflicts of Interest
References
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Condition | Y2O3 | YF3 |
---|---|---|
Primary gas flow rate (L/min) | 45 | 45 |
Secondary current (L/min) | 6 | 6 |
Gun moving rate (cm/s) | 10 | 10 |
System voltage (V) | 50 | 50 |
Gun power (kW) | 15 | 15 |
Stand-off (cm) | 10 | 10 |
Condition | Y2O3 | YF3 |
---|---|---|
RF source power (W) | 1300 | 1300 |
RF bias power (W) | 500 | 500 |
Chamber pressure (Pa) | 1.06 | 1.06 |
CF4:O2 (sccm) | 30:5 | 30:5 |
Etching time (min) | 60 | 60 |
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Lin, T.-K.; Wang, W.-K.; Huang, S.-Y.; Tasi, C.-T.; Wuu, D.-S. Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings. Nanomaterials 2017, 7, 183. https://doi.org/10.3390/nano7070183
Lin T-K, Wang W-K, Huang S-Y, Tasi C-T, Wuu D-S. Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings. Nanomaterials. 2017; 7(7):183. https://doi.org/10.3390/nano7070183
Chicago/Turabian StyleLin, Tzu-Ken, Wei-Kai Wang, Shih-Yung Huang, Chi-Tsung Tasi, and Dong-Sing Wuu. 2017. "Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings" Nanomaterials 7, no. 7: 183. https://doi.org/10.3390/nano7070183