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Advances in Chemical Vapor Deposition
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Advances in Chemical Vapor Deposition

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Manufacturing Processes and Systems".

Deadline for manuscript submissions: closed (1 March 2020) | Viewed by 25993

Printed Edition Available!
A printed edition of this Special Issue is available here.

Special Issue Editor

Dr. Dimitra Vernardou

E-Mail Website1 Website2
Guest Editor
Center of Materials Technology and Photonics, School of Engineering, Hellenic Mediterranean University, 710 04 Heraklion, Crete, Greece
Interests: CVD; metal oxides; chromogenic materials; electrodes; batteries; capacitors
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

We would like to invite you to submit your work to a Special Issue on “Advances in Chemical Vapor Deposition”. Chemical Vapor Deposition (CVD) is a process for producing solid products from gases. In a typical process, the reactants are transported to the substrate surface in the form of vapors and gases involving the dissociation and/or chemical reactions of gaseous reactants in an activated environment. CVD offers a compromise between efficiency, controllability and repeatability in the coverage of substrates for a range of applications including polymer coatings, large-screen displays, solar cells etc. The aim of this Special Issue is to give an overview of the latest experimental findings and identify the growth parameters and characteristics with desired qualities in terms of producing potentially useful devices.

Dr. Dimitra Vernardou
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (7 papers)

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Editorial

Jump to: Research, Review, Other

3 pages, 169 KiB  
Editorial
Special Issue: Advances in Chemical Vapor Deposition
by Dimitra Vernardou
Materials 2020, 13(18), 4167; https://doi.org/10.3390/ma13184167 - 19 Sep 2020
Cited by 10 | Viewed by 2449
Abstract
Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of [...] Read more.
Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayer on substrates. Hence, CVD meets all the requirements for industrialization in basically everything including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” has been dedicated to giving an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)

Research

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17 pages, 10575 KiB  
Article
Process-Induced Nanostructures on Anatase Single Crystals via Pulsed-Pressure MOCVD
by Rukmini Gorthy, Susan Krumdieck and Catherine Bishop
Materials 2020, 13(7), 1668; https://doi.org/10.3390/ma13071668 - 03 Apr 2020
Cited by 4 | Viewed by 2517
Abstract
The recent global pandemic of COVID-19 highlights the urgent need for practical applications of anti-microbial coatings on touch-surfaces. Nanostructured TiO2 is a promising candidate for the passive reduction of transmission when applied to handles, push-plates and switches in hospitals. Here we report [...] Read more.
The recent global pandemic of COVID-19 highlights the urgent need for practical applications of anti-microbial coatings on touch-surfaces. Nanostructured TiO2 is a promising candidate for the passive reduction of transmission when applied to handles, push-plates and switches in hospitals. Here we report control of the nanostructure dimension of the mille-feuille crystal plates in anatase columnar crystals as a function of the coating thickness. This nanoplate thickness is key to achieving the large aspect ratio of surface area to migration path length. TiO2 solid coatings were prepared by pulsed-pressure metalorganic chemical vapor deposition (pp-MOCVD) under the same deposition temperature and mass flux, with thickness ranging from 1.3–16 μm, by varying the number of precursor pulses. SEM and STEM were used to measure the mille-feuille plate width which is believed to be a key functional nano-dimension for photocatalytic activity. Competitive growth produces a larger columnar crystal diameter with thickness. The question is if the nano-dimension also increases with columnar crystal size. We report that the nano-dimension increases with the film thickness, ranging from 17–42 nm. The results of this study can be used to design a coating which has co-optimized thickness for durability and nano-dimension for enhanced photocatalytic properties. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)
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12 pages, 5621 KiB  
Article
Residual Gas Adsorption and Desorption in the Field Emission of Titanium-Coated Carbon Nanotubes
by Huzhong Zhang, Detian Li, Peter Wurz, Yongjun Cheng, Yongjun Wang, Chengxiang Wang, Jian Sun, Gang Li and Rico Georgio Fausch
Materials 2019, 12(18), 2937; https://doi.org/10.3390/ma12182937 - 11 Sep 2019
Cited by 9 | Viewed by 2250
Abstract
Titanium (Ti)-coated multiwall carbon nanotubes (CNTs) emitters based on the magnetron sputtering process are demonstrated, and the influences of modification to CNTs on the residual gas adsorption, gas desorption, and their field emission characteristic are discussed. Experimental results show that Ti nanoparticles are [...] Read more.
Titanium (Ti)-coated multiwall carbon nanotubes (CNTs) emitters based on the magnetron sputtering process are demonstrated, and the influences of modification to CNTs on the residual gas adsorption, gas desorption, and their field emission characteristic are discussed. Experimental results show that Ti nanoparticles are easily adsorbed on the surface of CNTs due to the “defects” produced by Ar+ irradiation pretreatment. X-ray photoelectron spectroscopy (XPS) characterization showed that Ti nanoparticles contribute to the adsorption of ambient molecules by changing the chemical bonding between C, Ti, and O. Field emission of CNTs coated with Ti nanoparticles agree well with the Fowler–Nordheim theory. The deviation of emission current under constant voltage is 6.3% and 8.6% for Ti-CNTs and pristine CNTs, respectively. The mass spectrometry analysis illustrated that Ti-coated CNTs have a better adsorption capacity at room temperature, as well as a lower outgassing effect than pristine CNTs after degassing in the process of field emission. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)
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13 pages, 9472 KiB  
Article
Use of a New Non-Pyrophoric Liquid Aluminum Precursor for Atomic Layer Deposition
by Xueming Xia, Alaric Taylor, Yifan Zhao, Stefan Guldin and Chris Blackman
Materials 2019, 12(9), 1429; https://doi.org/10.3390/ma12091429 - 02 May 2019
Cited by 6 | Viewed by 3507
Abstract
An Al2O3 thin film has been grown by vapor deposition using different Al precursors. The most commonly used precursor is trimethylaluminum, which is highly reactive and pyrophoric. In the purpose of searching for a more ideal Al source, the non-pyrophoric [...] Read more.
An Al2O3 thin film has been grown by vapor deposition using different Al precursors. The most commonly used precursor is trimethylaluminum, which is highly reactive and pyrophoric. In the purpose of searching for a more ideal Al source, the non-pyrophoric aluminum tri-sec-butoxide ([Al(OsBu)3], ATSB) was introduced as a novel precursor for atomic layer deposition (ALD). After demonstrating the deposition of Al2O3 via chemical vapor deposition (CVD) and ‘pulsed CVD’ routes, the use of ATSB in an atomic layer deposition (ALD)-like process was investigated and optimized to achieve self-limiting growth. The films were characterized using spectral reflectance, ellipsometry and UV-Vis before their composition was studied. The growth rate of Al2O3 via the ALD-like process was consistently 0.12 nm/cycle on glass, silicon and quartz substrates under the optimized conditions. Scanning electron microscopy and transmission electron microscopy images of the ALD-deposited Al2O3 films deposited on complex nanostructures demonstrated the conformity, uniformity and good thickness control of these films, suggesting a potential of being used as the protection layer in photoelectrochemical water splitting. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)
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Review

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17 pages, 2262 KiB  
Review
A Review of Perovskite Photovoltaic Materials’ Synthesis and Applications via Chemical Vapor Deposition Method
by Xia Liu, Lianzhen Cao, Zhen Guo, Yingde Li, Weibo Gao and Lianqun Zhou
Materials 2019, 12(20), 3304; https://doi.org/10.3390/ma12203304 - 11 Oct 2019
Cited by 29 | Viewed by 5783
Abstract
Perovskite photovoltaic materials (PPMs) have emerged as one of superstar object for applications in photovoltaics due to their excellent properties—such as band-gap tunability, high carrier mobility, high optical gain, astrong nonlinear response—as well as simplicity of their integration with other types of optical [...] Read more.
Perovskite photovoltaic materials (PPMs) have emerged as one of superstar object for applications in photovoltaics due to their excellent properties—such as band-gap tunability, high carrier mobility, high optical gain, astrong nonlinear response—as well as simplicity of their integration with other types of optical and electronic structures. Meanwhile, PPMS and their constructed devices still present many challenges, such as stability, repeatability, and large area fabrication methods and so on. The key issue is: how can PPMs be prepared using an effective way which most of the readers care about. Chemical vapor deposition (CVD) technology with high efficiency, controllability, and repeatability has been regarded as a cost-effective road for fabricating high quality perovskites. This paper provides an overview of the recent progress in the synthesis and application of various PPMs via the CVD method. We mainly summarize the influence of different CVD technologies and important experimental parameters (temperature, pressure, growth environment, etc.) on the stabilization, structural design, and performance optimization of PPMS and devices. Furthermore, current challenges in the synthesis and application of PPMS using the CVD method are highlighted with suggested areas for future research. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)
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8 pages, 8071 KiB  
Review
Advancements, Challenges and Prospects of Chemical Vapour Pressure at Atmospheric Pressure on Vanadium Dioxide Structures
by Charalampos Drosos and Dimitra Vernardou
Materials 2018, 11(3), 384; https://doi.org/10.3390/ma11030384 - 05 Mar 2018
Cited by 18 | Viewed by 5106
Abstract
Vanadium (IV) oxide (VO2) layers have received extensive interest for applications in smart windows to batteries and gas sensors due to the multi-phases of the oxide. Among the methods utilized for their growth, chemical vapour deposition is a technology that is [...] Read more.
Vanadium (IV) oxide (VO2) layers have received extensive interest for applications in smart windows to batteries and gas sensors due to the multi-phases of the oxide. Among the methods utilized for their growth, chemical vapour deposition is a technology that is proven to be industrially competitive because of its simplicity when performed at atmospheric pressure (APCVD). APCVD’s success has shown that it is possible to create tough and stable materials in which their stoichiometry may be precisely controlled. Initially, we give a brief overview of the basic processes taking place during this procedure. Then, we present recent progress on experimental procedures for isolating different polymorphs of VO2. We outline emerging techniques and processes that yield in optimum characteristics for potentially useful layers. Finally, we discuss the possibility to grow 2D VO2 by APCVD. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)
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Other

9 pages, 4569 KiB  
Letter
Electrochromic Performance of V2O5 Thin Films Grown by Spray Pyrolysis
by Kyriakos Mouratis, Valentin Tudose, Cosmin Romanitan, Cristina Pachiu, Oana Tutunaru, Mirela Suchea, Stelios Couris, Dimitra Vernardou and Koudoumas Emmanouel
Materials 2020, 13(17), 3859; https://doi.org/10.3390/ma13173859 - 01 Sep 2020
Cited by 19 | Viewed by 2945
Abstract
A new approach regarding the development of nanostructured V2O5 electrochromic thin films at low temperature (250 °C), using air-carrier spray deposition and ammonium metavanadate in water as precursor is presented. The obtained V2O5 films were characterized by [...] Read more.
A new approach regarding the development of nanostructured V2O5 electrochromic thin films at low temperature (250 °C), using air-carrier spray deposition and ammonium metavanadate in water as precursor is presented. The obtained V2O5 films were characterized by X-ray diffraction, scanning electron microscopy and Raman spectroscopy, while their electrochromic response was studied using UV-vis absorption spectroscopy and cyclic voltammetry. The study showed that this simple, cost effective, suitable for large area deposition method can lead to V2O5 films with large active surface for electrochromic applications. Full article
(This article belongs to the Special Issue Advances in Chemical Vapor Deposition)
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