Ma, H.-P.; Lu, H.-L.; Yang, J.-H.; Li, X.-X.; Wang, T.; Huang, W.; Yuan, G.-J.; Komarov, F.F.; Zhang, D.W.
Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition. Nanomaterials 2018, 8, 1008.
https://doi.org/10.3390/nano8121008
AMA Style
Ma H-P, Lu H-L, Yang J-H, Li X-X, Wang T, Huang W, Yuan G-J, Komarov FF, Zhang DW.
Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition. Nanomaterials. 2018; 8(12):1008.
https://doi.org/10.3390/nano8121008
Chicago/Turabian Style
Ma, Hong-Ping, Hong-Liang Lu, Jia-He Yang, Xiao-Xi Li, Tao Wang, Wei Huang, Guang-Jie Yuan, Fadei F. Komarov, and David Wei Zhang.
2018. "Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition" Nanomaterials 8, no. 12: 1008.
https://doi.org/10.3390/nano8121008
APA Style
Ma, H. -P., Lu, H. -L., Yang, J. -H., Li, X. -X., Wang, T., Huang, W., Yuan, G. -J., Komarov, F. F., & Zhang, D. W.
(2018). Measurements of Microstructural, Chemical, Optical, and Electrical Properties of Silicon-Oxygen-Nitrogen Films Prepared by Plasma-Enhanced Atomic Layer Deposition. Nanomaterials, 8(12), 1008.
https://doi.org/10.3390/nano8121008