**About the Editor**

**David Cameron** received his PhD from the University of Glasgow (UK) in the field of molecular beam epitaxy. He joined the Royal Signals and Radar Establishment (UK) in 1979 and moved to Dublin City University, School of Electronic Engineering, (Ireland) in 1982 where he set up the Thin Film Materials Research Laboratory and became an Associate Professor. He moved to Lappeenranta University of Technology (Finland) in 2004 as Professor of Material Technology and set up and led the Advanced Surface Technology Research Laboratory (ASTRaL). He began work with the Department of Physical Electronics at Masaryk University (MU), Brno (Czech Republic) in 2017 as a Research Scientist to develop expertise in atomic layer deposition. He is the author of 143 peer-reviewed journal papers and 1 book (to date), with an h factor of 36 (Google Scholar). His research career has focused on thin film deposition—plasma CVD, magnetron sputtering, sol-gel deposition, and atomic layer deposition. He retired from MU in 2020.
