Silicon nitride (SiN) films deposited via plasma-enhanced chemical vapor deposition (PECVD) exhibit tunable tensile stress, which is critical for various microelectronic and optoelectronic applications. In this paper, the effects of silane (SiH4) flo...
SiO2 thin films are deposited by radio frequency (RF) plasma-enhanced chemical vapor deposition (PECVD) technique using SiH4 and N2O as precursor gases. The stoichiometry of SiO2 thin films is determined by the X-ray photoelectron spectroscopy (XPS),...
The prevention of glow-to-arc transition exhibited by micro dielectric barrier discharge (MDBD), as well as its long lifetime, has generated much excitement across a variety of applications. Silicon nitride (SiNx) is often used as a dielectric barrie...
An essential problem in managing CO2 and transforming it into methane as a useful fuel is the quest for adequately efficient and cheap catalysts. Another condition is imposed by the new designs of structured reactors, which require catalysts in the f...
The application of surface coatings is a popular technique to improve the performance of materials used for medical and dental implants. Ternary silicon carbon nitride (SiCN), obtained by introducing nitrogen into SiC, has attracted significant inter...
The influence of N incorporation on the optical properties of Si-rich a-SiCx films deposited by very high-frequency plasma-enhanced chemical vapor deposition (VHF PECVD) was investigated. The increase in N content in the films was found to cause a re...
The physicochemical properties of functional graphene are regulated by compositing with other nano-carbon materials or modifying functional groups on the surface through plasma processes. The functional graphene films with g-C3N4 and F-doped groups w...
In this paper we investigate influence of radio frequency plasma enhanced chemical vapor deposition (RF PECVD) process parameters, which include gas flows, pressure and temperature, as well as a way of sample placement in the reactor, on optical prop...
While the reverse water-gas shift (RWGS) reaction holds great promise as a method of converting CO2 to CO and subsequently into valuable fuels, achieving its commercial viability requires the development of highly efficient, selective, durable, and l...
In this paper, the analysis, synthesis and characterization of thin films of a-Si:H deposited by PECVD were carried out. Three types of films were deposited: In the first series (00 process), an intrinsic a-Si:H film was doped. In the second series (...
The deposition rates of protective coatings resembling polydimethylsiloxane (PDMS) were measured with numerous sensors placed at different positions on the walls of a plasma-enhanced chemical vapor deposition (PECVD) reactor with a volume of approxim...
The paper presents a study of a large-area field emitter based on a composite of vertically aligned carbon nanotubes covered with a continuous and conformal layer of nickel oxide by the atomic layer deposition method. The arrays of carbon nanotubes w...
The conversion efficiency of thin-film silicon solar cells needs to be improved to be competitive with respect to other technologies. For a more efficient use of light across the solar spectrum, multi-junction architectures are being considered. Ligh...
Polyamide 6 (PA6) is a commonly used material in many different sectors of modern industry. Herein, PA6 samples were coated with amorphous carbon layers (a-C:H) with increasing thickness up to 2 µm using radio frequency plasma enhanced chemical vapor...
Polycarbonate (PC) is a material that is used in many areas: automotive, aerospace engineering and data storage industries. Its hardness is of particular importance, but some applications are affected by its low wettability or scratch susceptibility....
Plasma-polymerised tetramethyldisiloxane (TMDSO) films are frequently applied as coatings for their abrasion resistance and barrier properties. By manipulating the deposition parameters, the chemical structure and thus mechanical properties of the fi...
The issue of potential-induced degradation (PID) has gained more concerns due to causing the catastrophic failures in photovoltaic (PV) modules. One of the approaches to diminish PID is to modify the anti-reflection coating (ARC) layer upon the front...
Boron as thin film material is of relevance for use in modern micro- and nano-fabrication technology. In this research boron thin films are realized by a number of physical and chemical deposition methods, including magnetron sputtering, electron-bea...
The use of plasma in semiconductor fabrication processes has been continuously increasing because of the miniaturization of semiconductor device structure, and plasma enhanced chemical vapor deposition (PECVD) has become a major process in thin film...
This study reports the chemical vapor deposition of amorphous boron carbonitride films on Si(100) and SiO2 substrates using a trimethylamine borane and nitrogen mixture. BCxNy films with different compositions were produced via variations in substrat...
In recent years, there has been growing interest in pH-responsive polymers. Polymers with ionizable tertiary amine groups, which have the potential to be used in many critical application areas due to their pKa values, have an important place in pH-r...
Plasma-enhanced chemical vapor deposition (PECVD) was used to obtain several graphite nanowall (GNW)-type films at different deposition times on silicon and copper to achieve various thicknesses of carbonic films for the development of electrochemica...
We performed a systematic study involving simulation and experimental techniques to develop induced-junction silicon photodetectors passivated with thermally grown SiO2 and plasma-enhanced chemical vapor deposited (PECVD) SiNx thin films that show a...
Improving semiconductor equipment and components is an important goal of semiconductor manufacture. Especially during the deposition process, the temperature of the wafer must be precisely controlled to form a uniform thin film. In the conventional p...
Protection of silver surface from corrosion is an important topic, as this metal is highly susceptible to damage by atomic oxygen, halogenated, acidic and sulfur-containing molecules. Protective coatings need to be efficient at relatively small thick...
In this paper, the analysis of silicon oxynitride (SiON) films, deposited utilizing the plasma enhanced chemical vapor deposition (PECVD) process, for optical waveguides on silicon wafers is presented. The impact of N2O flow rate on various SiON film...
In this study, hydrophobic poly(hexafluorobutyl acrylate) (PHFBA) thin films were successfully deposited over a large area of 25 × 50 cm using plasma-enhanced chemical vapor deposition (PECVD). Key parameters, including plasma power and the dis...
In plasma-enhanced chemical vapor deposition (PECVD) processes, thin films can accumulate on the inner chamber walls, resulting in particle contamination and process drift. In this study, we investigate the physical and chemical properties of these w...
We report on low-temperature and low-pressure deposition conditions of 140 °C and 1.5 mTorr, respectively, to achieve high-optical quality silicon nitride thin films. We deposit the silicon nitride films using an electron cyclotron resonance plasma-e...
Plasma polymer films typically consist of very short fragments of the precursor molecules. That rather limits the applicability of most plasma polymerisation/plasma-enhanced chemical vapour deposition (PECVD) processes in cases where retention of lon...
Stopping the plasma-enhanced chemical vapor deposition (PECVD) once and maintaining the film in a vacuum for 30 s were performed. This was done several times during the formation of a film of i-layer microcrystalline silicon (μc-Si:H) used in thin-fi...
In this study, silicon nitride (SiNx) thin films were deposited on polyimide (PI) substrates as barrier layers by a plasma enhanced chemical vapor deposition (PECVD) system. The gallium-doped zinc oxide (GZO) thin films were deposited on PI and SiNx/...
TiO2 is a promising photocatalyst, but its large bandgap restricts its light absorption to the ultraviolet region. The addition of noble metals can reduce the bandgap and electron-hole recombination; therefore, we prepared TiO2-Ag nanoparticle compos...
Using methane as a carbon source, low-dimensional carbon nanomaterials were obtained in this work. The films were deposited directly on glass substrates by radio frequency plasma-enhanced chemical vapor deposition (RF-PECVD). The configuration and co...
To improve the chemical durability of SiC-based coatings on glass-ceramics, the effects of annealing and N2 plasma treatment were investigated. Fluorapatite glass-ceramic disks were coated with SiC via plasma-enhanced chemical vapor deposition (PECVD...
Silicon nitride and silicon oxynitride thin films are widely used in microelectronic fabrication and microelectromechanical systems (MEMS). Their mechanical properties are important for MEMS structures; however, these properties are rarely reported,...
Diamond-like carbon (DLC) thin films, prepared by a radio frequency plasma-enhanced chemical vapor deposition (PECVD) system, were investigated for application as an anti-reflective coating (ARC) for dye-sensitized solar cells (DSSCs) with a change i...
In this work, we report on the deposition of microcrystalline silicon (µc-Si:H) films produced from silane (SiH4), hydrogen (H2), and argon (Ar) mixtures using the plasma-enhanced chemical vapor deposition (PECVD) technique at 200 °C. Parti...
This study demonstrates the low-temperature (<100 °C) process for growing a thin silica buffer layer and aluminum oxide by atomic layer deposition (ALD) in the same reaction chamber. Heterogeneous multilayer thin films are prepared by a dual-m...
Zinc oxide nanoparticles were obtained by plasma-enhanced chemical vapor deposition (PECVD) under optical emission spectrometry control from elemental high-purity zinc in a zinc–oxygen–hydrogen plasma-forming gas mixture with varying depo...
Significant progress has been made in recent years in the use of atmospheric pressure plasma techniques for surface modification. This research focused on the beneficial effects of these processes on natural by-products, specifically those involving...
Plasma Enhanced–Chemical Vapor Deposition (PE-CVD) of polyethylene oxide-like (PEO)-like coatings represent a successful strategy to address cell-behavior on biomaterials. Indeed, one of the main drawbacks of organic and hydrophilic films, like...
In this work, we present the electrochemical deposition of manganese dioxide (MnO2) thin films on carbon-coated TiN/Si micro-pillars. The carbon buffer layer, grown by plasma enhanced chemical vapor deposition (PECVD), is used as a protective coating...
Mesoporous silicon dioxide films have been shown to be well suited as adhesion-promoting interlayers for generating high-strength polymer–metal interfaces. These films can be fabricated via microwave plasma-enhanced chemical vapor deposition us...
Low-temperature synthesis of Bi2Se3 thin film semiconductor thermoelectric materials is prepared by the plasma-enhanced chemical vapor deposition method. The Bi2Se3 film demonstrated excellent crystallinity due to the Se-rich environment. Experimenta...
Niobium-containing diamond-like carbon films (a-C:H:Nb) were deposited in a hybrid plasma-enhanced chemical vapor deposition (PECVD) and direct-current magnetron sputtering (DCMS) process, using a niobium target in an argon/acetylene atmosphere on in...
PECVD SiC:H (SiCN:H) films were produced using tetramethylsilane (TMS) as a precursor in a mixture with inert helium or ammonia as a source of nitrogen. Mild plasma conditions were chosen in order to prevent the complete decomposition of the precurso...
Molybdenum disulfide (MoS2) has attracted considerable attention as a promising electrocatalyst for the hydrogen evolution reaction (HER). However, the catalytic HER performance of MoS2 is significantly limited by the few active sites and low electri...
In this study, carbon nanosheets were deposited on the surface of graphite films for surface modification using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) method. The effects of catalyst addition and concentration, growth ga...
Plasma-enhanced chemical vapor deposition (PECVD) was used to produce new Ru-based thin catalytic films. The surface molecular structure of the films was examined by X-ray photoelectron spectroscopy (XPS). To determine the electro- and photoelectroch...
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