Nitride-Based Materials for Flexible MEMS Tactile and Flow Sensors in Robotics
Abstract
:1. Introduction
2. Materials
2.1. Silicon Nitride Stressor Layer
2.2. Aluminum Nitride Stressor Layer
2.3. Piezoelectric Properties of Aluminum Nitride
3. Methods
3.1. Microfabrication of Piezoresistive Upwards-Bent Cantilever Beams
3.2. Microfabrication of Piezoelectric Tactile Membranes
4. Results and Applications
4.1. Piezoresistive Flow Sensing: Mimicking the Biological Lateral Line Organ
4.1.1. Bio-Inspired Artificial Hair Cells
4.1.2. Artificial Lateral Line Flow Rate and Velocity Sensing
4.2. Piezoelectric Tactile Sensing: Mimicking the Human Tactile Sense
4.2.1. Tactile Sensors
4.2.2. Tactile Sensing System
5. Conclusions
Acknowledgments
Author Contributions
Conflicts of Interest
Abbreviations
AlN | Aluminum Nitride |
CCC | Cross-Correlation Coefficient |
CCF | Cross-Correlation Function |
CMOS | Complementary Metal-Oxide-Semiconductor |
CMP | Chemical Mechanical Polishing |
COC | Cyclic Olefin Copolymer |
CVP | Chemical Vapor Deposition |
Cr | Chrome |
DRIE | Deep Reactive Ion Etching |
DSDT | Dome-Shaped Diaphragm Transducer |
ICP | Inductively Coupled Plasma |
KOH | Potassium Hydroxide |
LPCVD | Low Pressure Chemical Vapor Deposition |
LTO | Low Temperature Oxide |
MEMS | Micro-Electro-Mechanical Systems |
Mo | Molybdenum |
PECVD | Plasma-Enhanced Chemical Vapor Deposition |
pMUT | Piezoelectric Micromachined Ultrasonic Transducers |
PVDF | Polyvinylidene Difluoride |
PZT | Lead Zirconate Titanate |
RIE | Reactive Ion Etching |
SF6 | Sulfur Hexafluoride |
Si | Silicon |
SiCl | Silicon Tetrachloride |
SiN | Silicon Nitride |
SiO | Silicon Dioxide |
SOI | Silicon-On-Insulator |
TrFE | Trifluoroethylene |
UT | Ultrasonic Transducer |
VDF | Vinylidene Fluoride |
ZnO | Zinc Oxide |
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Authors | Hair Geometry a | Aspect Ratio | Performance b,c |
---|---|---|---|
Ozaki et al. (2000) [53] | Vertical beam () | 12:1 | n/a |
Ozaki et al. (2000) [53] | Vertical pillar () | 3.5:1 | n/a |
Fan et al. (2002) [54], Chen et al. (2003) [55] | Vertical beam () | 8.2:1 | n/a |
Engel et al. (2005) [56] | Vertical pillar () | 6:1 | S = 245 ppm/ |
Tucker et al. (2006) [57], Chen et al. (2007) [58] | Vertical pillar () | 7.5:1 | S = 200 = 100 |
Peleshanko et al. (2007) [59] | Dome-like cupula () | 1:2 | S = 75 |
Wang et al. (2007) [7] | Bent cantilever () | 10:1 | S = 0.0284 /( ) R = 0–45 |
Wang et al. (2008) [15] | Bent cantilever () | 22.3:1 | n/a |
Aiyar et al. (2009) [60] | Bent flag () | 3.8:1 | S = 66 /( ) R = 0–16.9 |
Du et al. (2009) [61,62] | Cantilever () | 1:1 | S = 60 /( ) |
McConney et al. (2009) [63] | Capped vertical pillar () | 5:1 | S = 100 S = 2.5 |
Song et al. (2009) [64] | Bent flag () | 5.8:1 | S = 14.5 /( ) R = 0–12 |
Zhou et al. (2009) [37], Zhang et al. (2010) [9] | Bent cantilever () | 5:1 | S = 1.5–3.5 /( ) R = 0–0.23 |
Qualtieri et al. (2011) [26] | Bent cantilever () | 6:1 | n/a |
Qualtieri et al. (2012) [38] | Bent cantilever () | 15:1 | S = 0.7 mV/( ) R = 0.05–0.35 |
Yilmazoglu et al. (2016) [52] | Vertical beam () | 1.4:1 | S = 2100 ppm/ |
Authors | Material | Shape | Spatial Res. a (mm) | Min. Force (mN) | Dynamic Sensitivity (mV N−1) | Static Sensitivity (fF N−1) | Load Range (mN) | Voltage Output (mV) |
---|---|---|---|---|---|---|---|---|
Li et al. (2008) [29] | PVDF-TrFE | Dome | 0.5 | 25 | up to 10.6 | / | 0–1000 | 0–11 |
Kim et al. (2014) [30] | PVDF | Dome | 0.9 | 15 | up to 8830 | / | 0–500 | 0–5000 |
Dagdeviren et al. (2014) [39] | PZT | Flat | 0.25 | 2 | 11.6 | / | 2–10.5 | 0.001–0.1 |
Lee et al. (2014) [40] | PZT | Flat | 3 | 15.2 | 105 | / | 10–100 | 1–12 |
Khan et al. (2015) [31] | PVDF-TrFe + MWCN | Flat | / | 200 | 500 | / | 400–4000 | 4–16 |
Maita et al. (2014) [33] | AlN | Flat | / | 500 | 13 | / | 500–2000 | 3–10 |
Mastronardi et al. (2014, 2015) [27,82] | AlN | Dome | 0.75 | 1.2 | up to 480 | up to 950 | 0–60 | 0–37 |
Authors | Material | Shape | Radius (μm) | Resonance Frequency (kHz) | Displacement (nm) | Driving Voltage (V) |
---|---|---|---|---|---|---|
Shelton et al. (2009) [83] | Si/SiO/AlN | Flat circular | 175–225 | 220 | 1000–1300 | 0.5–7 |
Przybyla et al. (2010) [84] | Si/SiO/AlN | Flat circular | 200 | 214 | 100–750 | 0.5–15 |
Akhbari et al. (2014) [77] | Si/AlN | Concave curved circular | 60–95 | 500–2190 | 0–5 | 0–10 |
Guedes et al. (2011) [85] | Si/SiO/AlN | Flat flexurally suspended circular | 200 | 121.3 | 0–1100 | 0–30 |
Mastronardi et al. (2014) [28] | PI/AlN | Dome curved circular | 250–300 | 390–680 | 0.5–8 | 0–10 |
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Abels, C.; Mastronardi, V.M.; Guido, F.; Dattoma, T.; Qualtieri, A.; Megill, W.M.; De Vittorio, M.; Rizzi, F. Nitride-Based Materials for Flexible MEMS Tactile and Flow Sensors in Robotics. Sensors 2017, 17, 1080. https://doi.org/10.3390/s17051080
Abels C, Mastronardi VM, Guido F, Dattoma T, Qualtieri A, Megill WM, De Vittorio M, Rizzi F. Nitride-Based Materials for Flexible MEMS Tactile and Flow Sensors in Robotics. Sensors. 2017; 17(5):1080. https://doi.org/10.3390/s17051080
Chicago/Turabian StyleAbels, Claudio, Vincenzo Mariano Mastronardi, Francesco Guido, Tommaso Dattoma, Antonio Qualtieri, William M. Megill, Massimo De Vittorio, and Francesco Rizzi. 2017. "Nitride-Based Materials for Flexible MEMS Tactile and Flow Sensors in Robotics" Sensors 17, no. 5: 1080. https://doi.org/10.3390/s17051080