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Journal: Micromachines, 2021
Volume: 12
Number: 1551

Article: Atmosphere Effect in Post-Annealing Treatments for Amorphous InGaZnO Thin-Film Transistors with SiOx Passivation Layers
Authors: by Wen Zhang, Zenghui Fan, Ao Shen and Chengyuan Dong
Link: https://www.mdpi.com/2072-666X/12/12/1551

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