Shear Thickening Polishing of Quartz Glass
Abstract
:1. Introduction
2. Principle of Shear Thickening Polishing
3. Experimental Method and Condition
3.1. Experimental Process and Conditions
3.2. Preparation of STP Slurry
4. Results and Discussion
4.1. Material Removal Mechanism of Quartz Glass with Different Slurry
4.2. Polishing at Different pH Values
4.3. Polishing at Different Speeds
4.4. Polishing at Different Concentrations
4.5. Polishing Experiment with Selected Parameters
5. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
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Parameters | Values |
---|---|
Abrasive particles | SiO2 (80 nm on average), CeO2 (100 nm on average) |
The diameter of the polishing tank (mm) | 400 |
Inclination angle (°) | 13 |
Polishing speed (rpm) | 80, 90, 100, 110 |
Concentration (wt%) | 2, 4, 6, 8 |
The slurry pH value | 7, 8, 10, 12 |
Parameters | Values |
---|---|
Content of SiO2 (%) | 99.95 |
Density (g/cm3) | 2.2 |
Melting point (°C) | 1150 |
Mohs hardness | 7 |
Poisson ratio ν | 0.17 |
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Shao, Q.; Duan, S.; Fu, L.; Lyu, B.; Zhao, P.; Yuan, J. Shear Thickening Polishing of Quartz Glass. Micromachines 2021, 12, 956. https://doi.org/10.3390/mi12080956
Shao Q, Duan S, Fu L, Lyu B, Zhao P, Yuan J. Shear Thickening Polishing of Quartz Glass. Micromachines. 2021; 12(8):956. https://doi.org/10.3390/mi12080956
Chicago/Turabian StyleShao, Qi, Shixiang Duan, Lin Fu, Binghai Lyu, Ping Zhao, and Julong Yuan. 2021. "Shear Thickening Polishing of Quartz Glass" Micromachines 12, no. 8: 956. https://doi.org/10.3390/mi12080956