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Journal: Micromachines, 2022
Volume: 13
Number: 1551

Article: Vertical Gate-All-Around Device Architecture to Improve the Device Performance for Sub-5-nm Technology
Authors: by Changwoo Noh, Changwoo Han, Sang Min Won and Changhwan Shin
Link: https://www.mdpi.com/2072-666X/13/9/1551

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