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Journal: MicromachinesVolume: 15Number: 1499
Article: Enhancing Resistive Switching in AlN-Based Memristors Through Oxidative Al2O3 Layer Formation: A Study on Preparation Techniques and Performance Impact
  • Authors:
  • Hongxuan Guo1,*,
  • Jiahao Yao1 and
  • Siyuan Chen1
  • et al.
Link: https://www.mdpi.com/2072-666X/15/12/1499

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