The Development of the Stress-Free Polishing System Based on the Positioning Error Analysis for the Deterministic Polishing of Jet Electrochemical Machining
Abstract
:1. Introduction
2. Mechanism
2.1. The Mechanism of Jet-ECM
2.2. The Mechanism of Deterministic Polishing Based on Jet-ECM
2.3. The Influence of Nozzle Positioning Errors on Deterministic Polishing Based on Jet-ECM
3. Experiments
3.1. Experimental Device Design
3.1.1. Mechanical Devices
3.1.2. Motion Control System
3.1.3. Accessory Devices
3.2. Experimental Parameters
4. Results and Discussion
4.1. The Positioning Accuracy of the Assembled Device
4.2. The MRR Function of Jet-ECM
4.3. The Polishing Results of the Stress-Free Deterministic Polishing Based on Jet-ECM
5. Conclusions
- (1)
- The stress-free deterministic polishing based on Jet-ECM combines electrochemical dissolution, nozzle path planning, and nozzle speed control to achieve the flattening of the workpiece. Through this method, the PV value of the surface can be effectively reduced, which indicates that surface shape accuracy was improved. Also, it can provide an important supplement to the deterministic processing.
- (2)
- When the actual nozzle position deviates from the predicted position, the material removal amounts distribution of the workpiece is changed, resulting in machining errors. In Jet-ECM, the MRR is Gaussian-type. It can be concluded from the mathematical model that the requirements of the machine device accuracy are related to the shape of the material removal. The larger the MRR diameter di, the lower the machine device accuracy requirement is needed. As the diameter of the MRR decreases, the requirements for positioning accuracy increase. When the di is 3 mm, the nozzle positioning errors in the X and Y directions are required to be less than 110 μm. Based on the principle of precision distribution, the positioning accuracy of the machine device should be superior to 27 μm, respectively.
- (3)
- The specific device for the stress-free deterministic polishing based on Jet-ECM was designed. The positioning errors of the X-rail and Y-rail of the machine device are 6.9 μm and 3.6 μm. The specific device was used for stress-free deterministic polishing based on Jet-ECM. After processing for 34 min, the PV value of the surface was reduced from 2.67 μm to 1.24 μm. According to the PSD analysis, the low frequency spatial errors of the surface height distribution were significantly eliminated after polishing, which means the surface shape accuracy was significantly improved.
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
Nomenclature
Symbol | Explanation |
rs | The distance between an arbitrary predicted nozzle position A and a random location B on the workpiece surface |
rs′ | The distance between the actual nozzle position A′ and a random location B on the workpiece surface |
m(rs) | A mathematical function to describe the line profile of the Jet-ECM MRR |
Δx | Nozzle positioning error in X direction |
Δy | Nozzle positioning error in Y direction |
ε | The deviation between the theoretical MRR and actual MRR |
kw | The deviation rate |
d | The eigenvalue of the Gaussian function |
di | The diameter of the pit machined by Jet-ECM |
rz | The distance from a random point to the symmetry axis |
ei | The distance between the nozzle center and the workpiece symmetric center which represents the nozzle revolution radius during the deterministic polishing |
ωi | Nozzle moving speed during the deterministic polishing |
ni | Nozzle revolution numbers in ei |
PV | The surface peak and valley value |
CMP | Chemical mechanical polishing |
CCOS | Computer-controlled optical surfacing |
Jet-ECM | Jet electrochemical machining |
MRR | The material removal rate |
PSD | The power spectral density |
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Composition | Value |
---|---|
Phosphoric acid/mL | 425 |
Ethanol/mL | 45 |
Lactic acid/mL | 30 |
Benzotriazole/g | 3 |
Ammonium acetate/g | 1.5 |
Parameters | Value |
---|---|
Voltage/V | 6.5 |
Frequency/kHz | 10 |
Duty ratio/% | 50 |
Gap/mm | 0.6 |
Electrolyte temperature/°C | 35 |
Ring Groove Serial Numbers | Revolution Radius ei (mm) | Nozzle Moving Speed ωi (rad/s) | Revolution Numbers ni |
---|---|---|---|
1 | e1 = 1 | 4π/12 | 2 |
2 | e2 = 2 | 4π/18 | 2 |
3 | e3 = 3 | 4π/35 | 2 |
4 | e4 = 4 | 4π/35 | 2 |
5 | e5 = 5 | 4π/59 | 2 |
6 | e6 = 6 | 4π/47 | 2 |
7 | e7 = 7 | 4π/85 | 2 |
8 | e8 = 8 | 4π/60 | 2 |
9 | e9 = 9 | 4π/105 | 2 |
10 | e10 = 10 | 4π/75 | 2 |
11 | e11 = 11 | 4π/115 | 2 |
12 | e12 = 12 | 4π/90 | 2 |
13 | e13 = 13 | 4π/130 | 2 |
14 | e14 = 14 | 4π/95 | 2 |
15 | e15 = 15 | 4π/140 | 2 |
16 | e16 = 16 | 4π/95 | 2 |
17 | e17 = 17 | 4π/145 | 2 |
18 | e18 = 18 | 4π/100 | 2 |
19 | e19 = 19 | 4π/140 | 2 |
20 | e20 = 20 | 4π/85 | 2 |
21 | e21 = 21 | 4π/135 | 2 |
22 | e22 = 22 | 4π/80 | 2 |
23 | e23 = 23 | 4π/120 | 2 |
24 | e24 = 24 | 4π/45 | 2 |
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Wang, K.; Wang, H.; Zhang, Y.; Shi, H.; Shi, J. The Development of the Stress-Free Polishing System Based on the Positioning Error Analysis for the Deterministic Polishing of Jet Electrochemical Machining. Micromachines 2024, 15, 393. https://doi.org/10.3390/mi15030393
Wang K, Wang H, Zhang Y, Shi H, Shi J. The Development of the Stress-Free Polishing System Based on the Positioning Error Analysis for the Deterministic Polishing of Jet Electrochemical Machining. Micromachines. 2024; 15(3):393. https://doi.org/10.3390/mi15030393
Chicago/Turabian StyleWang, Ke, Hongding Wang, Yanlong Zhang, Huirong Shi, and Jiahao Shi. 2024. "The Development of the Stress-Free Polishing System Based on the Positioning Error Analysis for the Deterministic Polishing of Jet Electrochemical Machining" Micromachines 15, no. 3: 393. https://doi.org/10.3390/mi15030393
APA StyleWang, K., Wang, H., Zhang, Y., Shi, H., & Shi, J. (2024). The Development of the Stress-Free Polishing System Based on the Positioning Error Analysis for the Deterministic Polishing of Jet Electrochemical Machining. Micromachines, 15(3), 393. https://doi.org/10.3390/mi15030393