Chemical Vapor Deposition of IrTe2 Thin Films
Abstract
:1. Introduction
2. Materials and Methods
2.1. Materials
2.2. CVD Growth of IrTe2 Films
2.2.1. IrTe2 Growth Using Ir(acac)3 Precursor
2.2.2. IrTe2 Growth Using IrCl3 Precursor
2.2.3. IrTe2 Growth Using Element Ir as the Precursor
2.3. Characterization
3. Results and Discussion
4. Conclusions
Supplementary Materials
Author Contributions
Funding
Conflicts of Interest
References
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Zhou, R.; Zhao, Z.; Wu, J.; Xie, L. Chemical Vapor Deposition of IrTe2 Thin Films. Crystals 2020, 10, 575. https://doi.org/10.3390/cryst10070575
Zhou R, Zhao Z, Wu J, Xie L. Chemical Vapor Deposition of IrTe2 Thin Films. Crystals. 2020; 10(7):575. https://doi.org/10.3390/cryst10070575
Chicago/Turabian StyleZhou, Rui, Zhaoyang Zhao, Juanxia Wu, and Liming Xie. 2020. "Chemical Vapor Deposition of IrTe2 Thin Films" Crystals 10, no. 7: 575. https://doi.org/10.3390/cryst10070575