Zhang, S.; Fu, H.; Fan, G.; Li, T.; Han, J.; Zhao, L.
Study on Deposition Conditions in Coupled Polysilicon CVD Furnaces by Simulations. Crystals 2022, 12, 1129.
https://doi.org/10.3390/cryst12081129
AMA Style
Zhang S, Fu H, Fan G, Li T, Han J, Zhao L.
Study on Deposition Conditions in Coupled Polysilicon CVD Furnaces by Simulations. Crystals. 2022; 12(8):1129.
https://doi.org/10.3390/cryst12081129
Chicago/Turabian Style
Zhang, Shengtao, Hao Fu, Guofeng Fan, Tie Li, Jindou Han, and Lili Zhao.
2022. "Study on Deposition Conditions in Coupled Polysilicon CVD Furnaces by Simulations" Crystals 12, no. 8: 1129.
https://doi.org/10.3390/cryst12081129
APA Style
Zhang, S., Fu, H., Fan, G., Li, T., Han, J., & Zhao, L.
(2022). Study on Deposition Conditions in Coupled Polysilicon CVD Furnaces by Simulations. Crystals, 12(8), 1129.
https://doi.org/10.3390/cryst12081129