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Journal: Crystals, 2018
Volume: 8
Number: 248

Article: Investigation of HfO2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry
Authors: by Xuguang Luo, Yao Li, Hong Yang, Yuanlan Liang, Kaiyan He, Wenhong Sun, Hao-Hsiung Lin, Shude Yao, Xiang Lu, Lingyu Wan and Zhechuan Feng
Link: https://www.mdpi.com/2073-4352/8/6/248

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