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Journal: Membranes, 2022
Volume: 12
Number: 49

Article: Improving Device Characteristics of Dual-Gate IGZO Thin-Film Transistors with Ar–O2 Mixed Plasma Treatment and Rapid Thermal Annealing
Authors: by Wei-Sheng Liu, Chih-Hao Hsu, Yu Jiang, Yi-Chun Lai and Hsing-Chun Kuo
Link: https://www.mdpi.com/2077-0375/12/1/49

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