Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells
Abstract
:1. Introduction
2. Materials and Methods
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Conflicts of Interest
References
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Back Contact Stack | Eff (%) | FF (%) | Voc (V) | Jsc (A/cm2) | Rs (Ω) |
---|---|---|---|---|---|
Mo | 9.055 | 62.86 | 0.5182 | 27.80 | 7.36 |
Mo/TiN/Mo | 9.944 | 66.45 | 0.5286 | 28.31 | 7.03 |
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Woo, H.-J.; Lee, W.-J.; Koh, E.-K.; Jang, S.I.; Kim, S.; Moon, H.; Kwon, S.-H. Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells. Nanomaterials 2021, 11, 370. https://doi.org/10.3390/nano11020370
Woo H-J, Lee W-J, Koh E-K, Jang SI, Kim S, Moon H, Kwon S-H. Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells. Nanomaterials. 2021; 11(2):370. https://doi.org/10.3390/nano11020370
Chicago/Turabian StyleWoo, Hyun-Jae, Woo-Jae Lee, Eun-Kyong Koh, Seung Il Jang, Shinho Kim, Hyoungseok Moon, and Se-Hun Kwon. 2021. "Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells" Nanomaterials 11, no. 2: 370. https://doi.org/10.3390/nano11020370