Microstructure Evaluation and Impurities in La Containing Silicon Oxynitrides
Abstract
:1. Introduction
2. Experimental
3. Results and Discussion
3.1. Influence of Time and Temperature
3.2. Influence of Raw Materials and Nitrogen Pressure
3.3. Observation of Interface between Glass and Niobium Crucible
3.4. Optical Microscopy Observations
3.5. Scanning Electron Microscopy
3.6. Raman Spectroscopy
3.7. Atomic Force Microscopy (AFM), Transmission Electron Microscopy (TEM) and Electron Energy-Loss Spectroscopy (EELS) Analysis
3.8. Comparison with La−Si−O−N Thin Films
4. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Hakeem, A.S.; Ali, S.; Höche, T.; Drmosh, Q.A.; Khan, A.A.; Jonson, B. Microstructure Evaluation and Impurities in La Containing Silicon Oxynitrides. Nanomaterials 2021, 11, 1896. https://doi.org/10.3390/nano11081896
Hakeem AS, Ali S, Höche T, Drmosh QA, Khan AA, Jonson B. Microstructure Evaluation and Impurities in La Containing Silicon Oxynitrides. Nanomaterials. 2021; 11(8):1896. https://doi.org/10.3390/nano11081896
Chicago/Turabian StyleHakeem, Abbas Saeed, Sharafat Ali, Thomas Höche, Qasem Ahmed Drmosh, Amir Azam Khan, and Bo Jonson. 2021. "Microstructure Evaluation and Impurities in La Containing Silicon Oxynitrides" Nanomaterials 11, no. 8: 1896. https://doi.org/10.3390/nano11081896