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Journal: Nanomaterials, 2023
Volume: 13
Number: 436

Article: UV-Nanoimprint and Deep Reactive Ion Etching of High Efficiency Silicon Metalenses: High Throughput at Low Cost with Excellent Resolution and Repeatability
Authors: by Christopher A. Dirdal, Karolina Milenko, Anand Summanwar, Firehun T. Dullo, Paul C. V. Thrane, Oana Rasoga, Andrei M. Avram, Adrian Dinescu and Angela M. Baracu
Link: https://www.mdpi.com/2079-4991/13/3/436

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