Lodha, J.K.; Meersschaut, J.; Pasquali, M.; Billington, H.; Gendt, S.D.; Armini, S.
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms. Nanomaterials 2024, 14, 1212.
https://doi.org/10.3390/nano14141212
AMA Style
Lodha JK, Meersschaut J, Pasquali M, Billington H, Gendt SD, Armini S.
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms. Nanomaterials. 2024; 14(14):1212.
https://doi.org/10.3390/nano14141212
Chicago/Turabian Style
Lodha, Jayant Kumar, Johan Meersschaut, Mattia Pasquali, Hans Billington, Stefan De Gendt, and Silvia Armini.
2024. "Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms" Nanomaterials 14, no. 14: 1212.
https://doi.org/10.3390/nano14141212
APA Style
Lodha, J. K., Meersschaut, J., Pasquali, M., Billington, H., Gendt, S. D., & Armini, S.
(2024). Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms. Nanomaterials, 14(14), 1212.
https://doi.org/10.3390/nano14141212