Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter
Abstract
:1. Introduction
2. Materials and Methods
3. Results
4. Conclusions
Supplementary Materials
Author Contributions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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Samples | Remanent Polarization (2Pr) (μC/cm2) | Coercive Field (V) |
---|---|---|
Pt | 14.24 (±0.01) | 4.03 |
TiN | 7.43 (±0.01) | 1.89 |
Si | 0.88 (±0.01) | 0.58 |
Samples | Binding Energy (eV) | |||
---|---|---|---|---|
Hf2O3 | Oxygen Vacancy | HfO2 | Ti2O3 | |
Pt | 532.78 | 531.85 | 530.9 | - |
TiN | 533.02 | 532.43 | 530.87 | 531.61 |
Si | 532.93 | 532.03 | 531.08 | - |
Samples | Relative binding ratio (%) | |||
Hf2O3 | Oxygen vacancy | HfO2 | Ti2O3 | |
Pt | 27.71 | 7.76 | 64.53 | - |
TiN | 33.51 | 6.1 | 45.99 | 14.4 |
Si | 24.9 | 6 | 69.1 | - |
Sample | Binding Energy (eV) | |||
---|---|---|---|---|
Hf4+ 4f5/2 | Hf4+ 4f7/2 | Hf3+ 4f5/2 | Hf3+ 4f7/2 | |
Pt | 19.34 | 17.74 | 18.76 | 17.14 |
TiN | 19.55 | 17.87 | 18.98 | 17.34 |
Si | 19.57 | 17.94 | 18.78 | 17.18 |
Samples | Relative binding ratio (%) | |||
Hf4+ | Hf3+ | |||
Pt | 69.67 (±0.01) | 30.33 (±0.01) | ||
TiN | 71.79 (±0.01) | 28.21 (±0.01) | ||
Si | 84.09 (±0.01) | 15.91 (±0.01) |
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Lim, S.; Ahn, Y.; Won, B.; Lee, S.; Park, H.; Kumar, M.; Seo, H. Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter. Nanomaterials 2024, 14, 1386. https://doi.org/10.3390/nano14171386
Lim S, Ahn Y, Won B, Lee S, Park H, Kumar M, Seo H. Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter. Nanomaterials. 2024; 14(17):1386. https://doi.org/10.3390/nano14171386
Chicago/Turabian StyleLim, Seokwon, Yeonghwan Ahn, Beomho Won, Suwan Lee, Hayoung Park, Mohit Kumar, and Hyungtak Seo. 2024. "Effects of Substrate and Annealing Conditions on the Ferroelectric Properties of Non-Doped HfO2 Deposited by RF Plasma Sputter" Nanomaterials 14, no. 17: 1386. https://doi.org/10.3390/nano14171386