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Colossal Dielectric Constant of Nanocrystalline/Amorphous Homo-Composite BaTiO3 Films Deposited via Pulsed Laser Deposition Technique
by
Shinya Kondo
Shinya Kondo
,
Taichi Murakami
Taichi Murakami
Loick Pichon
Loick Pichon
Joël Leblanc-Lavoie
Joël Leblanc-Lavoie
Takashi Teranishi
Takashi Teranishi
Akira Kishimoto
Akira Kishimoto
My Ali El Khakani
My Ali El Khakani
1
Graduate School of Environmental, Life, Natural Science and Technology, Okayama University, 3-1-1 Tsushima-naka, Kita-ku, Okayama 700-8530, Japan
2
Institut National de la Recherche Scientifique (INRS), Centre Énergie, Matériaux et Télécommunications, 1650 Boulevard Lionel-Boulet, Varennes, QC J3X 1P7, Canada
3
Laboratory for Materials and Structures, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
*
Authors to whom correspondence should be addressed.
Nanomaterials 2024, 14(20), 1677; https://doi.org/10.3390/nano14201677 (registering DOI)
Submission received: 22 August 2024
/
Revised: 28 September 2024
/
Accepted: 16 October 2024
/
Published: 18 October 2024
Abstract
We report the pulsed laser deposition (PLD) of nanocrystalline/amorphous homo-composite BaTiO3 (BTO) films exhibiting an unprecedented combination of a colossal dielectric constant (εr) and extremely low dielectric loss (tan δ). By varying the substrate deposition temperature (Td) over a wide range (300–800 °C), we identified Td = 550 °C as the optimal temperature for growing BTO films with an εr as high as ~3060 and a tan δ as low as 0.04 (at 20 kHz). High-resolution transmission electron microscopy revealed that the PLD-BTO films consist of BTO nanocrystals (~20–30 nm size) embedded within an otherwise amorphous BTO matrix. The impressive dielectric behavior is attributed to the combination of highly crystallized small BTO nanograins, which amplify interfacial polarization, and the surrounding amorphous matrix, which effectively isolates the nanograins from charge carrier transport. Our findings could facilitate the development of next-generation integrated dielectric devices.
Share and Cite
MDPI and ACS Style
Kondo, S.; Murakami, T.; Pichon, L.; Leblanc-Lavoie, J.; Teranishi, T.; Kishimoto, A.; El Khakani, M.A.
Colossal Dielectric Constant of Nanocrystalline/Amorphous Homo-Composite BaTiO3 Films Deposited via Pulsed Laser Deposition Technique. Nanomaterials 2024, 14, 1677.
https://doi.org/10.3390/nano14201677
AMA Style
Kondo S, Murakami T, Pichon L, Leblanc-Lavoie J, Teranishi T, Kishimoto A, El Khakani MA.
Colossal Dielectric Constant of Nanocrystalline/Amorphous Homo-Composite BaTiO3 Films Deposited via Pulsed Laser Deposition Technique. Nanomaterials. 2024; 14(20):1677.
https://doi.org/10.3390/nano14201677
Chicago/Turabian Style
Kondo, Shinya, Taichi Murakami, Loick Pichon, Joël Leblanc-Lavoie, Takashi Teranishi, Akira Kishimoto, and My Ali El Khakani.
2024. "Colossal Dielectric Constant of Nanocrystalline/Amorphous Homo-Composite BaTiO3 Films Deposited via Pulsed Laser Deposition Technique" Nanomaterials 14, no. 20: 1677.
https://doi.org/10.3390/nano14201677
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