Freddi, S.; Gherardi, M.; Chiappini, A.; Arette-Hourquet, A.; Berbezier, I.; Fedorov, A.; Chrastina, D.; Bollani, M.
Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures. Nanomaterials 2025, 15, 965.
https://doi.org/10.3390/nano15130965
AMA Style
Freddi S, Gherardi M, Chiappini A, Arette-Hourquet A, Berbezier I, Fedorov A, Chrastina D, Bollani M.
Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures. Nanomaterials. 2025; 15(13):965.
https://doi.org/10.3390/nano15130965
Chicago/Turabian Style
Freddi, Sonia, Michele Gherardi, Andrea Chiappini, Adam Arette-Hourquet, Isabelle Berbezier, Alexey Fedorov, Daniel Chrastina, and Monica Bollani.
2025. "Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures" Nanomaterials 15, no. 13: 965.
https://doi.org/10.3390/nano15130965
APA Style
Freddi, S., Gherardi, M., Chiappini, A., Arette-Hourquet, A., Berbezier, I., Fedorov, A., Chrastina, D., & Bollani, M.
(2025). Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures. Nanomaterials, 15(13), 965.
https://doi.org/10.3390/nano15130965