Chen, Q.-Z.; Zhang, Z.-X.; Fu, W.-Q.; Duan, J.-R.; Yang, Y.-X.; Chen, C.-N.; Lien, S.-Y.
Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments. Nanomaterials 2025, 15, 986.
https://doi.org/10.3390/nano15130986
AMA Style
Chen Q-Z, Zhang Z-X, Fu W-Q, Duan J-R, Yang Y-X, Chen C-N, Lien S-Y.
Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments. Nanomaterials. 2025; 15(13):986.
https://doi.org/10.3390/nano15130986
Chicago/Turabian Style
Chen, Qi-Zhen, Zhi-Xuan Zhang, Wan-Qiang Fu, Jing-Ru Duan, Yu-Xin Yang, Chao-Nan Chen, and Shui-Yang Lien.
2025. "Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments" Nanomaterials 15, no. 13: 986.
https://doi.org/10.3390/nano15130986
APA Style
Chen, Q.-Z., Zhang, Z.-X., Fu, W.-Q., Duan, J.-R., Yang, Y.-X., Chen, C.-N., & Lien, S.-Y.
(2025). Low Resistivity and High Carrier Concentration in SnO2 Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments. Nanomaterials, 15(13), 986.
https://doi.org/10.3390/nano15130986
