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Journal: Photonics, 2025
Volume: 12
Number: 226
Article:
Effects of Electron Beam Lithography Process Parameters on the Structure of Nanoscale Devices Across Three Substrate Materials
Authors:
by
Zhongyang Liu, Yue Chen, Xuanyu Li, Luwei Wang and Junle Qu
Link:
https://www.mdpi.com/2304-6732/12/3/226
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