Emoto, A.; Honda, J.; Suzuki, K.; Kimoto, T.; Fukuda, T.
Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization. Photonics 2019, 6, 62.
https://doi.org/10.3390/photonics6020062
AMA Style
Emoto A, Honda J, Suzuki K, Kimoto T, Fukuda T.
Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization. Photonics. 2019; 6(2):62.
https://doi.org/10.3390/photonics6020062
Chicago/Turabian Style
Emoto, Akira, Junya Honda, Kou Suzuki, Takumi Kimoto, and Takashi Fukuda.
2019. "Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization" Photonics 6, no. 2: 62.
https://doi.org/10.3390/photonics6020062
APA Style
Emoto, A., Honda, J., Suzuki, K., Kimoto, T., & Fukuda, T.
(2019). Fabrication of Modified Random Phase Masks with Phase Modulation Elements Exhibiting Gaussian Profiles Using Molecular Migration under Photopolymerization. Photonics, 6(2), 62.
https://doi.org/10.3390/photonics6020062