Electrodeposition of Cu on PEDOT for a Hybrid Solid-State Electronic Device
Round 1
Reviewer 1 Report
- Chemically synthesized PEDOT:PSS is highly conducting and widely used as transparent hole transporter electrode in opto-electronic devices. Authors should mention in the introduction section that why they choose to make electrochemically doped PEDOT.
- Authors should provide the relevant information regarding the stability of PEDOT in acidic solution of H2SO4. Possibly a Raman analysis should be present for before and after.
- There is no mention of thickness of PEDOT. This is important to know if their devices were shorted.
- The authors are suggested to provide AFM analysis for better understanding of comparative roughness and grain size. This will add to the merit of the study in journal "Surfaces".
- The graphs in Figure 4 for Raman and visible spectroscopy data should be in the same format as other. It is better to follow single format for the journal.
- A full image in of the device win Figure 6 including edges should be shown. The figure should also include an estimation of thickness variation from edge to center.
- Resistance values are very low. Authors should describe how contacts were made. For confirmation, authors can lightly de-dope the PEDOT film before metal deposition by applying reverse polarity in the solution and make it less conductive and check for the resistance for the new device. A doping dependent analysis will add to the merit of current study.
- There is no mention of the final figure (Figure 7?) in the text in the electrical impedance spectroscopy section nor it is captioned.
Author Response
Please see the attachment
Author Response File: Author Response.doc
Reviewer 2 Report
Please correct minor editorial mistakes (page 3 line 99 should be ...on silicon (1.5 x 1.5 cm2. The....) and page 3 line 108 should be ...Metrohm...
Good laboratory work, clearly presented but lacks novelty, described procedures are known for the last nearly 20 years. Some progress is in PEDOT/ITO optimization deposition procedure, correctly choosing nucleation/growth steps.
Author Response
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Author Response File: Author Response.doc