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10.3390/ma17020386
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Article

Effect of Magnetic Field on Maskless Localized Electrodepositing Three-Dimensional Microstructure of Nano Nickel Crystals

by
Menghua Wu
1,
Bingchun Jiang
1,
Yuqing Xiao
2 and
Weiping Jia
2,*
1
School of Mechanical and Electrical Engineering, Guangdong University of Science and Technology, Dongguan 523083, China
2
School of Mechanical Engineering, Dalian University, Dalian 116622, China
*
Author to whom correspondence should be addressed.
Materials 2024, 17(2), 386; https://doi.org/10.3390/ma17020386
Submission received: 2 December 2023 / Revised: 5 January 2024 / Accepted: 10 January 2024 / Published: 12 January 2024
(This article belongs to the Special Issue Advanced Additive Manufacturing and Application)
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Abstract

In the intricate process of maskless localized electrodeposition (MLED) for fabricating three-dimensional microstructures, specifically nickel micro-columns with an aspect ratio of 7:1, magnetic fields of defined strength were employed, oriented both parallel and anti-parallel to the electric field. The aim was to achieve nanocrystalline microstructures and elevated deposition rates. A detailed comparative analysis was conducted to examine the volumetric deposition rate, surface morphology, and grain size of the MLED nickel crystal 3D microstructures, both in the absence and presence of the two magnetic field directions, facilitated by a self-assembled experimental setup. The results indicate that the anti-parallel magnetic field significantly boosts the volumetric deposition rate to a notable 19,050.65 μm3/s and refines the grain size, achieving an average size of 24.82 nm. Conversely, the parallel magnetic field is found to enhance the surface morphology of the MLED nickel crystal 3D microstructure.
Keywords: magnetic field; maskless localized electrodeposition; nanocrystalline nickel; three-dimensional microstructures magnetic field; maskless localized electrodeposition; nanocrystalline nickel; three-dimensional microstructures

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MDPI and ACS Style

Wu, M.; Jiang, B.; Xiao, Y.; Jia, W. Effect of Magnetic Field on Maskless Localized Electrodepositing Three-Dimensional Microstructure of Nano Nickel Crystals. Materials 2024, 17, 386. https://doi.org/10.3390/ma17020386

AMA Style

Wu M, Jiang B, Xiao Y, Jia W. Effect of Magnetic Field on Maskless Localized Electrodepositing Three-Dimensional Microstructure of Nano Nickel Crystals. Materials. 2024; 17(2):386. https://doi.org/10.3390/ma17020386

Chicago/Turabian Style

Wu, Menghua, Bingchun Jiang, Yuqing Xiao, and Weiping Jia. 2024. "Effect of Magnetic Field on Maskless Localized Electrodepositing Three-Dimensional Microstructure of Nano Nickel Crystals" Materials 17, no. 2: 386. https://doi.org/10.3390/ma17020386

APA Style

Wu, M., Jiang, B., Xiao, Y., & Jia, W. (2024). Effect of Magnetic Field on Maskless Localized Electrodepositing Three-Dimensional Microstructure of Nano Nickel Crystals. Materials, 17(2), 386. https://doi.org/10.3390/ma17020386

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