Lin, T.-K.; Wang, W.-K.; Huang, S.-Y.; Tasi, C.-T.; Wuu, D.-S.
Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings. Nanomaterials 2017, 7, 183.
https://doi.org/10.3390/nano7070183
AMA Style
Lin T-K, Wang W-K, Huang S-Y, Tasi C-T, Wuu D-S.
Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings. Nanomaterials. 2017; 7(7):183.
https://doi.org/10.3390/nano7070183
Chicago/Turabian Style
Lin, Tzu-Ken, Wei-Kai Wang, Shih-Yung Huang, Chi-Tsung Tasi, and Dong-Sing Wuu.
2017. "Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings" Nanomaterials 7, no. 7: 183.
https://doi.org/10.3390/nano7070183
APA Style
Lin, T.-K., Wang, W.-K., Huang, S.-Y., Tasi, C.-T., & Wuu, D.-S.
(2017). Comparison of Erosion Behavior and Particle Contamination in Mass-Production CF4/O2 Plasma Chambers Using Y2O3 and YF3 Protective Coatings. Nanomaterials, 7(7), 183.
https://doi.org/10.3390/nano7070183