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Editorial

Acknowledgment to Reviewers of JMMP in 2021

by
JMMP Editorial Office
MDPI AG, St. Alban-Anlage 66, 4052 Basel, Switzerland
J. Manuf. Mater. Process. 2022, 6(1), 19; https://doi.org/10.3390/jmmp6010019
Published: 26 January 2022
Rigorous peer-reviews are the basis of high-quality academic publishing. Thanks to the great efforts of our reviewers, JMMP was able to maintain its standards for the high quality of its published papers. Thanks to the contribution of our reviewers, in 2021, the median time to first decision was 14 days and the median time to publication was 35 days. The editors would like to extend their gratitude and recognition to the following reviewers for their precious time and dedication, regardless of whether the papers they reviewed were finally published:
Abisset-Chavanne, EmmanuelleMikó, Balázs
Afonso, FredericoMolnár, Viktor
Afonso, Rafael M.Moon, Seung-Jae
Ahmed, NaveedMoradi, Mahmoud
Alber-Laukant, BettinaMoramarco, Vincenzo
Ali, UsmanMorar, Nicolau Iralal
Ando, YasutakaMoravec, Ján
Artola, GarikoitzMoreno, Jaime
Baiamonte, LidiaMróz, Sebastian
Barasinski, AnaïsMucha, Jacek
Bayraktar, EminMukherjee, Tuhin
Bazan, AnnaMurčinková, Zuzana
Běhálek, LubošNagai, Moeto
Benhassine, MehdiNagit, Gheorghe
Berglund, JohanNassar, Abdalla
Bergs, ThomasNăsulea, Daniel Marius
Berlak, JoachimNelaturu, Phalgun
Bin, LinNemes, Ovidiu
Boko, IvicaNiagaj, Jerzy
Bordeenithikasem, PunnathatNiemczewska-Wójcik, Magdalena
Bracarense, Alexandre Q.Nikaeen, Peyman
Breaz, Radu-EugenNikam, Sagar
Bruni, CarloNiu, Jinbo
Cacko, RobertNobile, Riccardo
Cai, FengOgawa, Toshio
Calvo, RoqueOkugawa, Masayuki
Cárcel-Carrrasco, Francisco JavierOkunkova, Anna A.
Carlone, PierpaoloOlvera Trejo, Daniel
Carneiro, VitorÖpöz, Tahsin
Carraturo, MassimoOpran, Constantin
Carvalho, Gustavo H. S. F. L.Oßwald, Kai
Charalampous, PaschalisOtto, Andreas
Chaudry, Umer MasoodPan, Houwen
Chen, FurongPapadakis, Loucas
Chen, JiPape, Florian
Chen, Roland K.Park, Nokeun
Chen, YuhuaParshin, Sergey
Chen, YunPatterson, Albert E.
Chicos, Lucia-AntonetaPaweł, Płatek
Chougan, MehdiPeterka, Jozef
Chueh, Yuan-HuiPimenov, Danil
Cidade, Mariana KuhlPiscopo, Gabriele
Cimpoeşu, RamonaPiteľ, Ján
Condruz, Mihaela RalucaPivkin, Petr
Costica, BejinariuPlascencia-Jatomea, Maribel
Cui, JunjiaPodrabinnik, Pavel A.
Cui, XiaohuiPolasik, Robert
Czinege, ImrePolden, Joseph
Da Silva, Leonardo Rosa RibeiroPopa, Dan Cristian
De Backer, WoutPopov, Vladimir
De Finis, RosaPrashanth, Konda Gokuldoss
De Waele, WimPrates, Pedro
Deja, MariuszPrażmowski, Mariusz
Diniz, AnselmoPuerta Morales, Francisco Javier
Dobrocky, DavidQiao, Yanxin
Dobrzańska, JoannaQin, Yuchu
Dodun, OanaQuagliato, Luca
Duchosal, ArnaudRahman, Muhommad Azizur
Dudova, NadezhdaRakhadilov, Bauyrzhan
Dunaj, PawełRao, Posinasetti Nageswara
Durejko, TomaszRiveiro Rodriguez, Antonio
Dyl, TomaszRodic, Dragan
Dzierwa, AndrzejRodríguez González, Pablo
Dzionk, StefanRusso, Pietro
Ellendt, NilsSadek, Ahmad
Engelmann, BastianSafonov, Alexander
Erisov, YaroslavSajek, Adam
Errandonea, DanielSakai, Katsuhiko
Fan, ChenleiSales, David Lérida
Fang, HaixingSalvia, Michelle
Feito, NorbertoSammler, Fiona
Feng, YixuanSamołyk, Grzegorz
Fernández, PalomaSarkar, Sayan
Fidan, IsmailSavkovic, Borislav
Filip, PetrSchaeffer, Lirio
Filippov, AndreySchönemann, Lars
Fontes, PauloSemaltianos, Nikolaos
Foresti, RubenSenderowski, Cezary
Fracchia, ElisaSequeiros, Elsa
França, Thiago ValleSergejev, Fjodor
Fröck, HannesShalaby, Mohamed
Fu, RaoShen, Zhikang
Galvao, IvanShepelin, Nikita
Gavrus, AdinelShimada, Keita
Georgiou, Emmanuel P.Shokrani, Alborz
Ghosh, SupriyoShunmugasamy, Vasanth Chakravarthy
Godino, LeireSiczek, Krzysztof
Goh, Guo DongSieber, Ingo
Golovashchenko, SergeySili, Andrea
Golyshev, Alexander A.Siller, Hector
Gong, HaiSilva, Francisco
Gonzalez-Gutierrez, JoaminSing, Swee Leong
Gorji, Nima E.Sîrbu, Nicușor-Alin
Grossi, NiccolòSkrabalak, Grzegorz
Gryguć, AndrewSlatineanu, Laurentiu
Guo, QiangSlobodyan, Mikhail
Guo, YuelingSłodki, Bogdan
Gupta, MunishSlota, Ján
Gurau, CarmelaSocha, Grzegorz
Guraya, TeresaSoliman, Mohamed
Habibi, MohsenSrivastava, Anil
Han, YiweiStachurski, Wojciech
Harrison, NoelStanciu, Mariana Domnica
Hartl, ChristophStarman, Bojan
Haušild, PetrStehle, Thomas
Hawryluk, MarekStern, Adin
He, JiStetter, Ralf
Hegab, HussienSuárez, Alfredo
Heinemann, RobertSun, Jiamin
Hlaváčová, Irena M.Sun, Yongle
Hosseinpour, SamanSun, Zhonggang
Hu, QingxianSutowska, Marzena
Hu, ZhongweiŚwiercz, Rafał
Hyer, HoldenSzczucka-Lasota, Bożena
James, SagilSzwajka, Krzysztof
Jandaghi, Mohammad RezaTan, Dapeng
Jankowiak, TomaszTandecka, Katarzyna
Jasiewicz, MarcinTang, Kai
Jaśkiewicz, KarolTapoglou, Nikolaos
Javadi, YasharTarasov, Sergei Yu
Javidikia, MahshadTaysom, Brandon Scott
Jiang, GuoTeghil, Roberto
Jiang, LaiThiede, Sebastian
Jin, YifeiThumsorn, Supaphorn
Jurko, JozefTian, Xiaoqing
Kaiming, WangTofangchi, Alireza
Kalashnikova, Tatiana A.Tomków, Jacek
Kamiński, MarcinTong, Van-Canh
Karolczuk, AleksanderToribio, Jesús
Khmeleva, Marina G.Torzewski, Janusz
Khomenko, M. D.Tosello, Guido
Kik, TomaszToth, Frantisek
Kim, JedoTreutler, Kai
Kisiel, RyszardTrzepiecinski, Tomasz
Koike, MariTsai, Meng-Hsiu
Kolařík, LadislavTsao, Chung Chen
Konda Gokuldoss, PrashanthTzetzis, Dimitrios
Konovalov, SergeyUdroiu, Razvan
Kowalski, MateuszValerga Puerta, Ana Pilar
Kräusel, VerenaVasilescu, Mircea Dorin
Krimpenis, Agathoklis A.Velázquez Blázquez, Jose Sebastián
Kubalak, JosephVenettacci, Simone
Kučera, MariánVeniali, Francesco
Kukla, ChristianVereshchaka, Alexey A.
Kulagin, RomanVergara, Diego
Kulka, JozefVita, Alessio
Kuruc, MarcelVolosova, Marina A.
Kušnerová, MilenaVukelic, Djordje
Kyratsis, PanagiotisWachowski, Marcin
Kyziol, LeslawWang, Chuanjie
Lafont, UgoWang, Jian
Lassnig, AliceWang, Pan
lastname, firstnameWang, Tiegang
Lawrence, JonathanWang, Yongqiang
Lee, Chang-WhanWang, Yuanxun
Lee, Myoung GyuWang, Yunming
Lee, Yong-SeokWang, Zhongke
Lermen, Richard ThomasWatras, Adam
Lesiuk, GrzegorzWei, Haoyan
Li, DuoWei, Ying-Hui
Li, HaiWen, Peng
Li, JiehuaWessman, Andrew
Li, YaminWiederkehr, Petra
Liao, ZhirongWilliams, Nicholas X.
Liesegang, MoritzWinter, Sven
Lim, JiseokWojciechowski, Szymon
Lin, DongWu, Xian
Lin, Jhe-YuXiao, Zhiyu
Liu, ChangqingXie, Sijia
Liu, ChangyongXiong, Yi
Liu, FengchaoXu, Jijin
Liu, HongXu, Jinyang
Llanos, IñigoXu, Kaichen
Longhurst, William R.Xu, Xun William
Lontos, AntoniosXu, Zhengguo
López De Lacalle, Luis NorbertoXue, Hongqian
Lopez-Botello, OmarYan, Baijun
Lou, MingYang, Huaiwen
Lunt, Alexander J.G.Yang, Junfeng
Maamoun, AhmedYang, Shucai
Machno, MagdalenaYang, Shuming
Macko, MarekYang, Youwen
Madariaga, AitorYasuda, Kiyokazu
Magrinho, João P.Ye, Hang
Majerik, JozefYu, Haiping
Majlinger, KornelZaba, Krzysztof
Malhotra, RajivZeljkovic, Milan
Mandal, ParanjayeeZhai, Zhanyu
Mandolfino, ChiaraZhang, Baicheng
Manika, GeorgiaZhang, Chaoqun
Markopoulos, Angelos P.Zhang, Jianyue
Masztalerz, KlaudiaZhang, Jie
Maurotto, AgostinoZhang, Mingjun
Mazzucato, FedericoZhang, Xinfang
Mcnelley, Terry R.Zhang, Yan
Mena-Morcillo, EmmanuelZhang, Yang
Meng, BaoZhao, Haiyan
Mercado-Colmenero, Jorge ManuelZhao, Yufan
Michalcová, AlenaZheng, Yihao
Michalczyk, JacekZhou, Tianfeng
Mierzejewska, Żaneta AnnaZou, Li
Mierzwa, DominikZou, Yong
Mikno, Zygmunt
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MDPI and ACS Style

JMMP Editorial Office. Acknowledgment to Reviewers of JMMP in 2021. J. Manuf. Mater. Process. 2022, 6, 19. https://doi.org/10.3390/jmmp6010019

AMA Style

JMMP Editorial Office. Acknowledgment to Reviewers of JMMP in 2021. Journal of Manufacturing and Materials Processing. 2022; 6(1):19. https://doi.org/10.3390/jmmp6010019

Chicago/Turabian Style

JMMP Editorial Office. 2022. "Acknowledgment to Reviewers of JMMP in 2021" Journal of Manufacturing and Materials Processing 6, no. 1: 19. https://doi.org/10.3390/jmmp6010019

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