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Journal: Int. J. Mol. Sci., 2018
Volume: 19
Number: 2513

Article: Boron-Implanted Silicon Substrates for Physical Adsorption of DNA Origami
Authors: by Sadao Takabayashi, Shohei Kotani, Juan Flores-Estrada, Elijah Spears, Jennifer E. Padilla, Lizandra C. Godwin, Elton Graugnard, Wan Kuang, Scott Sills and William L. Hughes
Link: https://www.mdpi.com/1422-0067/19/9/2513

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