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Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160
 
 
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Materials 2020, 13(22), 5133; https://doi.org/10.3390/ma13225133
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