3.1. Typical Morphology of the Coated Samples Before and After Sintering
The surface qualities (FE-SEM scope) of the samples before and after sintering (including the protectively-sintered samples heated together with sponge titanium) can be obtained in
Figure 1. The added sponge titanium before and after heating is shown in
Figure 2.
In
Figure 1b3,c3, it can be concluded that the surface sintered together with the oxygen-absorbed material (affording more surface to reaction [
18]) was much brighter and clearer than the unprotected group. This result also matched the surface color change in
Figure 2 after sintering.
Figure 1a1,a2 shows that the as-received coatings were filled with cotton-shaped structures with diameters of about 500 to 2500 nm. The cotton structure is presented with a round shape and smooth boundary/interface, which indicates that the as-coated structure must be loose. This phenomenon might prefer the explanation that the as-coated layer was formed only by agglomeration (to decrease the surface energy), so the bonding might be weak. Furthermore, the coating was sputtered at room temperature, which indicated that the diffusion would be also weak in this step.
After sintering, the characteristics of morphology were changed obviously with significant differences. The protectively-sintered samples exhibited a smoother surface than the normally-sintered group. The gullies in the as-coated sample surface also coalesced after sintering. In (×1000 scale)
Figure 1a1,b1, it seems that the protectively-sintered surface partially inherited the cotton characteristics after heating, but the diameters are enlarged to 20–30 μm and the macro morphology seemed to be flatter. This result indicates that the protectively-sintered films are denser, formed by the reducing trend of the surface energy of the solid.
However, the cotton-shaped characteristic disappeared in the normally-sintered (without the protective metal) sample in
Figure 1c1. The sintered surface without protection, shown in
Figure 1c1, was filled with many irregular ripples and joined with holes, marked yellow in
Figure 1c2. The hole structure was also found in
Figure 1c1 in ×1000 scale. These results imply that when sintered without protection, the film structure would become porous, being not as dense as the protective sintering.
In
Figure 1b2,c2 it is clear that many of the precipitated phases of 50–500 nm diameters were also generated after sintering. The precipitated phases created in the protectively-sintered group were distributed more homogeneously than the normally-sintered group. It might be the reason that the precipitation of the normally-sintered group was disturbed by the reactions of pollution. When polluted, the composition of the outer layer of the materials should be different, which reasonably influenced the diffusions.
In summary, the morphology of the coatings obtained by protective-sintering was much cleaner than the comparison. The purpose of adding reactive metals was effective. After sintering, the morphology of the protectively-sintered group seemed to be denser than that of the others.
3.2. Chemical Composition Changes Before and After Sintering
To analyze the distributions of the elements of the films, EDS tests were needed. The EDS mappings of the as-coated, sintered and protectively-sintered samples of 500 nm depth are recorded in
Figure 3. The typical precipitation was also evaluated by EDS in
Figure 3d.
Figure 3 illustrates that all the main elements (Ni, Ti, Si, C, O) were distributed homogeneously before and after sintering (including the protective sintering). The uniform EDS mapping tests were necessary to ensure the detecting zone of the following analysis of phases and chemical compositions were reasonable.
The chemical contents were varied at different heat-treated states. The detected EDS chemical contents of the selected zones are shown in
Table 1 and
Figure 3 (for 500 nm samples).
For example, the contents of the as-coated samples (500 nm) were about 64.7 wt.% Ni and 35.3 wt.% Ti (too much Ni detected); after protective sintering (500 nm), oxygen (29.91 wt.%) was added into the main elements group and the fractions of Ni and Ti seemed to be balanced at 32.54 wt.%, 36.22 wt.%, respectively. The most important result was that the detected ratio of oxygen to metal was reduced in the protective sintering. This ratio was used to directly compare the oxygen changes of the Ni–Ti coatings to avoid data interference, because a large quantity of carbon was discovered from the normally-sintered group. This result shows that carbon could be another pollution source for sintering the coatings with a small surface area; it might come from the vacuum pump (oil), which was not obvious for this common component (with a huge surface area), but it was sensitive to the small surface samples. Furthermore, the EDS compositions seemed to be independent of the coating thickness, because the results with varying coating depth were close to each other, without a significant changing trend.
The typical 2 precipitations (from all the sintered samples including the protectively-sintered group) were identified as carbide (including Ti and Ni), shown in
Figure 3d. This could be regarded as the indirect evidence of the reactions of the metal-ceramic bonding because the outer surface of the layer should be a lack of carbon (for the protectively-sintered group) and the bright spots in the EDS figures in
Figure 1 should be the results of a long-range diffusion.
To explain the differences in the EDS compositions before and after sintering, the influences of the detecting depth for EDS should be concerned. It should be proposed that the EDS signals (reflecting X-ray) were generated strongly related to the atomic number of the samples. The heavy elements (with higher Kα energy levels) usually showed higher absorption ability of electron beams and X-rays; thus, the detecting depth of the heavy elements would be shorter.
The reflecting X-ray quantity contributed by each “layer” perpendicular to the z-direction can be estimated by the function
φ(
ρz). In this case,
ρ is the density of material and
z is the depth. The intensity of the generated X-ray is not monotonically increasing or decreasing with an increment of depth, because the X-ray generating zone was usually a drop-shaped zone under the electron beam bombardment. Therefore, the area of each generating “layer” would be increased firstly and then decreased with increment of depth, affecting the shape of function
φ(
ρz). The X-ray intensity should be decreasing with increasing depth by absorption [
26]. According to ISO 14594-2014,
φ(
ρz) could be calculated. The studied pure elements in this case (C, Si, Ti, and Ni) were calculated and are shown in
Figure 4 and
Figure 5; these results were found using the Leo-iTech EDS Analyzer 1.0 alpha.
In
Figure 4, it is clear that the light elements (C and Si) had much longer “tails”. The decay of the X-ray in light-element composition was weaker. It implies that the detected quantities of light elements should be much higher than the heavy elements in EDS at the same voltage. The fractions of residual X-ray (from z to infinity) for each element are shown in
Figure 5. This indicates that the detecting X-ray signal intensity had limited depth. The confirmed X-ray depth was calculated and is shown in
Figure 6.
In
Figure 6, the depth that 99% and 95% of the X-ray is detected are exhibited in (a) and (b), respectively. This figure was drawn with an assumption that the X-ray generating zone could be regarded approximately as a sphere. The detecting depth of EDS could be estimated as Equation (3) [
27].
In Equation (3), Zm is the X-ray generation depth, Ei is the energy of the incident electron, Ek is the critical excitation energy, ma is the atomic mass of the bombarded point, ρ is the mass density of the bombarded point, and Z is the atomic number of the bombarded point.
It can be concluded that the X-ray generation depths of C and Si, in this case, were much more than Ti and Ni at 15 kV. For a 95% X-ray situation, the generation depths of the selected elements C, Si, Ti, and Ni are 2208.56, 2094.09, 1050.50, and 408.21 nm, respectively. The data (for 99% X-ray) were 2915.32, 2764.20, 1386.65, and 538.54 nm.
Combined with the previous part (EDS results), it can be concluded that the real fraction of the heavy element Ni, in this case, should be larger than the given data in
Table 1, because the X-ray generating depth of Ni is much thicker than the other elements. The light elements of Si and C (including O) should not be as much as the presented data. The detected fraction of oxygen should also be enlarged (in EDS). However, oxygen could not directly fit the model in
Figure 4,
Figure 5 and
Figure 6, because it was not reasonable to regard oxygen as solid in that situation.
The calculations in
Figure 4,
Figure 5 and
Figure 6 could explain why the test voltage should be controlled equally as 15 kV. The changes in voltage would influence the detecting depth according to Equation (3), which contributes to the further distortions of the quantitative EDS data. The set 15 kV parameter also fitted the coating depth (400–600 nm) to the key element Ni (538.84 nm, 99%) to ensure the EDS in this part was reasonable (should have enough intensity of all the key elements).
Therefore, one could deduce the following analysis from the EDS changes before and after sintering in
Table 1.
Before sintering, the detected main elements were Ni (major part) and Ti (small part), and the real percentage of Ni should be more. It indicates that Ni should be accumulated in the outer layer of the coating at first. It means that the original element distributions in the z-direction were gradient, although the distributions parallel to the layer plane were homogeneous. A possible explanation is that the sputtering efficiency of Ni was larger than Ti in this situation [
28], which caused the slight segregation (in the z-direction) of sputtering. The set deposition temperature was too low to diffuse in the as-coated samples.
After protective-sintering at 1000 °C and 0.5 h, the thick films should be annealed as the diffused stable states, so the Ti/Ni ratio should be reasonable for the sputtering material.
However, the detected Ti/Ni ratio in the normally-sintered group was more than that of the protective-sintering. It might be the effect of structure (morphology). It could be found that the normally-sintered surface had been seriously polluted (oxidation), as shown in
Figure 1c1, containing many porous structures (bright) at the outer interface. The sintered coatings could not be as flat as the protective group; then the porous structure might cover the signal and should have been detected from the deeper layer (the EDS results were strongly dependent on the detecting depth, mentioned above). These porous structures (outer layer) could have been more likely the active Ti than the inert Ni. It was mentioned above that the EDS results are strongly dependent on the detecting depth.
Although the EDS compositions of the samples of different states were complex, the core trend was that the metal elements should have a diffusion of homogenization in the z-direction after heat treatment, and the Ti/Ni ratio detected should be increased after sintering. The ratio of oxygen to metal was also reduced in the protected group.
3.3. Phase Changes
To analyze the structures of the films in detail, the XRD results are essential. The XRD tests (including semi-quantitative analysis of phases) of the 3 different samples (coated, sintered, and protectively-sintered) with depths ranging from 400 to 600 nm are illustrated in
Figure 7,
Figure 8 and
Figure 9.
General speaking, it shows that the as-coated samples lacked an Ni phase in XRD (titanium rich). The compositions seemed to be more reasonable in the sintered groups, and the unprotected samples showed much more complex phases. The influences of depth were weak for these samples.
In
Figure 7, the results show that the main phase of the as-coated Ni-Ti film (400–600 nm) is titanium, identified as the Fm-3m (2 2 5) space group, face-centered cubic (FCC) structure. The patterns present well-defined peaks at 2
θ = 38.37° and 2
θ = 44.6°, which correspond to the typical (1 1 1) and (2 0 0) planes of the face-centered cubic (FCC) structure [
29]. The FCC structure is rare for titanium, but it was reported that the existing was reasonable in the thick film condition [
30]. The FCC phase could exist in film <720 nm and could be stable if <144 nm. The reported specific surface energies of the FCC and hexagonal closed-packed (HCP) structures were 1.99 and 2.47 J/m
2, respectively. The deduced strain energies of the FCC and HCP structures were 1.014 × 10
6 and 21.618 × 10
6 J/m
3, respectively. The total free energy change (
ΔG) of the z-direction atomic column Ti film from FCC to HCP can be described as Equation (4) [
30]. The schematic diagram of this differential element is shown in
Figure 10.
In Equation (4), t is the depth of the film, n is the total crystal plane (being parallel to the film surface) number in the selected atomic column, and Ω is the average atomic volume (regarded similar for the HCP and FCC states). The constant 1.12 × 10−20 is the recommended difference in bulk free energy (FCC-HCP) J/atom.
Hence, the strain energy of the FCC structure should be lower, but the specific surface energy was higher than the general HCP structure. The forming of the stable FCC phase required that ΔG should be positive, which indicated that it was possible to keep the stable FCC phases if the film depth was under a critical diameter. Therefore, the thin film structure requiring the higher surface area and lower volume should be the FCC structure to reduce the free energy.
However, the nickel phases of the as-coated samples were not obvious in
Figure 7. The nickel phase seemed to be not crystallized [
19]; the reason might be that the sputtering temperature was set too low.
It was also found that the SiC phases (including moissanite SiC) could be detected in 400–500 nm groups of the as-coated samples. 42.9 wt.% SiC (including moissanite SiC) was found in the 400 nm group and 5.3 wt.% in the 500 nm group, by FWHM. However, the 600 nm group detected few SiC. It showed that the detected SiC sharply decreased while the coating depth increased, nonlinearly. Therefore, the possible explanation is that the as-coated films < 500 nm depth were not compact, just as shown in
Figure 1a2. This result indicates that the coating of Ni–Ti should be deposited at least 600 nm to be qualified.
After heat-treated, all the samples showed a majority of Ni phase of FCC characteristic and Ti in FCC structure and oxide, which matched the EDS results in
Table 1. The available phases were FCC Ti, FCC Ni, and TiO
2, other existing phases (graphite, SiC, and moissanite SiC) should be interferences from sintering or substrates.
After protective sintering in
Figure 8, the analyzed pure Ni was 67.0 to 70.9 wt.%, and the pure Ti was 14.2 to 24.4 wt.% (except the part of Ti in TiO
2). The data are reasonable compared to the EDS results in
Table 1 because the Ti/Ni ratio in
Table 1 should be lower than the real values, according to the X-ray generating differences mentioned in
Section 3.2. Thus, the contents of XRD seemed to be more reasonable than EDS in this case. It was also presented that the fraction of TiO
2 increased with the coating depth increment. Thus, to obtain a well-active transition layer, a thinner coating seemed to be more efficient. Furthermore, it was fortunate that all the protectively-sintered samples showed few SiC signals because the coatings had been mostly compact, which matched the morphology in
Figure 1b1.
Thus, the most balanced coating depth in this situation could be concluded to be 500 nm: 400 nm could bring the risk of being uncompacted while 600 nm would cause more oxidation.
For the normally-sintered sample in
Figure 9, the phase composition was complex. The SiC phases (including moissanite SiC) were found in all the coatings ranging from 400 to 600 nm. Compared with the XRD result in
Figure 7 (SiC only appeared in the 400 and 500 nm groups) and typical morphology in
Figure 1c1, one might conclude that the unprotected samples were oxidized with the mentioned porous structures (in
Section 3.1 and
Section 3.2), which could not prevent the X-ray touching the substrates (SiC). Since this term existed, the trend of the phase changes was not clear in this situation. Nevertheless, the XRD results were also useful to estimate the degree of pollution. The carbon fractions in
Figure 9, by XRD, were lower and more reasonable than the EDS result in
Table 1 because the detected EDS fraction of carbon was excessive according to
Figure 4,
Figure 5 and
Figure 6.
In general, the sintering method of the two-step process would significantly influence the surface quality. Although a high vacuum was enough for common heat treatment, sintering for bonding should be strictly qualified. Therefore, protective sintering was recommended. The optimal coating depth was 500 nm. It was also essential that the XRD results were more faithful for the thin-film samples, especially for the light elements.