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Journal: Materials, 2021
Volume: 14
Number: 3026

Article: Silicon Oxide Etching Process of NF3 and F3NO Plasmas with a Residual Gas Analyzer
Authors: by Woo-Jae Kim, In-Young Bang, Ji-Hwan Kim, Yeon-Soo Park, Hee-Tae Kwon, Gi-Won Shin, Min-Ho Kang, Youngjun Cho, Byung-Hyang Kwon, Jung-Hun Kwak and Gi-Chung Kwon
Link: https://www.mdpi.com/1996-1944/14/11/3026

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