Bałczewski, P.; Kowalska, E.; Różycka-Sokołowska, E.; Uznański, P.; Wilk, J.; Koprowski, M.; Owsianik, K.; Marciniak, B.
Organosulfur Materials with High Photo- and Photo-Oxidation Stability: 10-Anthryl Sulfoxides and Sulfones and Their Photophysical Properties Dependent on the Sulfur Oxidation State. Materials 2021, 14, 3506.
https://doi.org/10.3390/ma14133506
AMA Style
Bałczewski P, Kowalska E, Różycka-Sokołowska E, Uznański P, Wilk J, Koprowski M, Owsianik K, Marciniak B.
Organosulfur Materials with High Photo- and Photo-Oxidation Stability: 10-Anthryl Sulfoxides and Sulfones and Their Photophysical Properties Dependent on the Sulfur Oxidation State. Materials. 2021; 14(13):3506.
https://doi.org/10.3390/ma14133506
Chicago/Turabian Style
Bałczewski, Piotr, Emilia Kowalska, Ewa Różycka-Sokołowska, Paweł Uznański, Joanna Wilk, Marek Koprowski, Krzysztof Owsianik, and Bernard Marciniak.
2021. "Organosulfur Materials with High Photo- and Photo-Oxidation Stability: 10-Anthryl Sulfoxides and Sulfones and Their Photophysical Properties Dependent on the Sulfur Oxidation State" Materials 14, no. 13: 3506.
https://doi.org/10.3390/ma14133506
APA Style
Bałczewski, P., Kowalska, E., Różycka-Sokołowska, E., Uznański, P., Wilk, J., Koprowski, M., Owsianik, K., & Marciniak, B.
(2021). Organosulfur Materials with High Photo- and Photo-Oxidation Stability: 10-Anthryl Sulfoxides and Sulfones and Their Photophysical Properties Dependent on the Sulfur Oxidation State. Materials, 14(13), 3506.
https://doi.org/10.3390/ma14133506