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Journal: Materials, 2021
Volume: 14
Number: 7532

Article: Numerical Simulation of Gas Phase Reaction for Epitaxial Chemical Vapor Deposition of Silicon Carbide by Methyltrichlorosilane in Horizontal Hot-Wall Reactor
Authors: by Botao Song, Bing Gao, Pengfei Han, Yue Yu and Xia Tang
Link: https://www.mdpi.com/1996-1944/14/24/7532

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