Oxygen and Nitrogen Transfer in Furnaces in Crystal Growth of Silicon by Czochralski and Directional Solidification Processes
Abstract
:1. Introduction
2. Experimental and Numerical Methods
2.1. Czochralski Method
2.2. Directional Solidification Method
3. Results
3.1. Czochralski Method
3.2. Directional Solidification Method
4. Summary
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Kakimoto, K.; Liu, X.; Nakano, S. Oxygen and Nitrogen Transfer in Furnaces in Crystal Growth of Silicon by Czochralski and Directional Solidification Processes. Materials 2022, 15, 1843. https://doi.org/10.3390/ma15051843
Kakimoto K, Liu X, Nakano S. Oxygen and Nitrogen Transfer in Furnaces in Crystal Growth of Silicon by Czochralski and Directional Solidification Processes. Materials. 2022; 15(5):1843. https://doi.org/10.3390/ma15051843
Chicago/Turabian StyleKakimoto, Koichi, Xin Liu, and Satoshi Nakano. 2022. "Oxygen and Nitrogen Transfer in Furnaces in Crystal Growth of Silicon by Czochralski and Directional Solidification Processes" Materials 15, no. 5: 1843. https://doi.org/10.3390/ma15051843