Next Article in Journal
Strength and Microstructure Assessment of Partially Replaced Ordinary Portland Cement and Calcium Sulfoaluminate Cement with Pozzolans and Spent Coffee Grounds
Previous Article in Journal
Removal of Impurities from EAFD Ammonium Carbonate Leachate and Upgrading the Purity of Prepared ZnO
Previous Article in Special Issue
Manufacturing Process, Microstructure and Physico-Mechanical Properties of W-Cr Coatings Reinforced by Cr3C2 Phase Produced on Tool Steel through Laser Processing
 
 
Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
Journals
Materials
Volume 16
Issue 14
10.3390/ma16145005
materials-logo
Submit to this Journal Review for this Journal Propose a Special Issue
► Article Menu

Article Menu

share Share announcement Help format_quote Cite question_answer Discuss in SciProfiles
first_page
settings
Order Article Reprints
Font Type:
Arial Georgia Verdana
Font Size:
Aa Aa Aa
Line Spacing:
Column Width:
Background:
Article

Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO2 Thin Films Deposited Using Pulsed DC Magnetron Sputtering

by
Ewa Mańkowska
1,
Michał Mazur
1,*,
Małgorzata Kalisz
2,
Marcin Grobelny
3,
Jarosław Domaradzki
1 and
Damian Wojcieszak
1
1
Faculty of Electronics, Photonics and Microsystems, Wrocław University of Science and Technology, Janiszewskiego 11/17, 50-372 Wrocław, Poland
2
Faculty of Engineering and Economics, Ignacy Mościcki University of Applied Sciences in Ciechanów, Narutowicza 9, 06-400 Ciechanów, Poland
3
Faculty of Technical and Social Sciences, Ignacy Mościcki University of Applied Sciences in Ciechanów, Warszawska 52, 06-500 Mława, Poland
*
Author to whom correspondence should be addressed.
Materials 2023, 16(14), 5005; https://doi.org/10.3390/ma16145005
Submission received: 18 May 2023 / Revised: 7 July 2023 / Accepted: 11 July 2023 / Published: 14 July 2023
(This article belongs to the Special Issue Mechanical and Tribological Properties of Advanced Materials and Coatings)
Browse Figures
Review Reports Versions Notes

Abstract

Various properties of HfO2, such as hardness, corrosion, or electrical resistance, depend on the method and the conditions of deposition. In this work, a thorough comparison of scarcely investigated mechanical properties of HfO2 thin films deposited with different conditions of reactive magnetron sputtering process is presented. Four thin films were sputtered in processes that varied in plasma ignition method (continuous or sequential) and target–substrate distance. The structural characteristics of the HfO2 thin films were examined using Raman spectroscopy and X-ray diffraction measurements. Furthermore, the optoelectronic properties were determined based on transmittance and current–voltage characteristics. The mechanical properties of the HfO2 thin films were determined using nanoindentation and scratch test. In turn, the corrosion properties were determined by analyzing the voltametric curves. The transparent HfO2 thin films deposited in the continuous process are characterized by better corrosion resistance than the same layer formed in the sequential process, regardless of the target–substrate distance (8 cm or 12 cm). Furthermore, these samples are also characterized by the highest value of Young’s modulus and scratch resistance. The combination of good corrosion and scratch resistance could contribute to the new application of HfO2 as a corrosion protective material.
Keywords: HfO2; nanohardness; Young’s modulus; corrosion resistance; optical properties; electrical properties; magnetron sputtering HfO2; nanohardness; Young’s modulus; corrosion resistance; optical properties; electrical properties; magnetron sputtering

Share and Cite

MDPI and ACS Style

Mańkowska, E.; Mazur, M.; Kalisz, M.; Grobelny, M.; Domaradzki, J.; Wojcieszak, D. Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO2 Thin Films Deposited Using Pulsed DC Magnetron Sputtering. Materials 2023, 16, 5005. https://doi.org/10.3390/ma16145005

AMA Style

Mańkowska E, Mazur M, Kalisz M, Grobelny M, Domaradzki J, Wojcieszak D. Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO2 Thin Films Deposited Using Pulsed DC Magnetron Sputtering. Materials. 2023; 16(14):5005. https://doi.org/10.3390/ma16145005

Chicago/Turabian Style

Mańkowska, Ewa, Michał Mazur, Małgorzata Kalisz, Marcin Grobelny, Jarosław Domaradzki, and Damian Wojcieszak. 2023. "Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO2 Thin Films Deposited Using Pulsed DC Magnetron Sputtering" Materials 16, no. 14: 5005. https://doi.org/10.3390/ma16145005

APA Style

Mańkowska, E., Mazur, M., Kalisz, M., Grobelny, M., Domaradzki, J., & Wojcieszak, D. (2023). Characterization of Structural, Optical, Corrosion, and Mechanical Properties of HfO2 Thin Films Deposited Using Pulsed DC Magnetron Sputtering. Materials, 16(14), 5005. https://doi.org/10.3390/ma16145005

Note that from the first issue of 2016, this journal uses article numbers instead of page numbers. See further details here.

Article Metrics

Back to TopTop