Investigation of Electropolishing for High-Gradient 1.3 GHz and 3.9 GHz Niobium Cavities
Abstract
:1. Introduction
2. EP devices at SHINE
2.1. EP Device for a Single-Cell Cavity
2.2. Parameters of the EP Device
3. Surface Treatment of 1.3 GHz Single-Cell Cavities
3.1. The 1.3 GHz Single-Cell Cavity Treatment
3.2. Optical Inspection of the Inner Surface
3.3. Vertical Test Results for the 1.3 GHz Single-Cell Cavities
4. Surface Treatment of 3.9 GHz Single-Cell Cavities
4.1. Updates of the EP Device for 3.9 GHz Single-Cell Cavities
4.2. Optical Inspection of the Inner Surface
4.3. Vertical Test Results for the 3.9 GHz Single-Cell Cavities
5. Discussion
6. Conclusions
7. Patents
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
Abbreviations
EP | Electropolishing |
SRF | Superconducting radio frequency |
BCP | Buffered chemical polishing |
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Parameters | 1.3 GHz Single-Cell Cavity | 3.9 GHz Single-Cell Cavity |
---|---|---|
Voltage | 15 V | 20 V |
Current | ∼15 A | ∼4 A |
Electrolyte temp. | 10 °C | 10 °C |
Average removal rate | ∼6 m/h | ∼10 m/h |
Electrolyte flow rate | 3 L/min | 2 L/min |
Cavity rotation speed | 1 rpm | |
Cooling water temp. | 7 °C |
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Zong, Y.; Chen, J.; Wang, D.; Xia, R.; Wu, J.; Wang, Z.; Xing, S.; Wu, X.; He, X.; Wang, X. Investigation of Electropolishing for High-Gradient 1.3 GHz and 3.9 GHz Niobium Cavities. Materials 2024, 17, 3207. https://doi.org/10.3390/ma17133207
Zong Y, Chen J, Wang D, Xia R, Wu J, Wang Z, Xing S, Wu X, He X, Wang X. Investigation of Electropolishing for High-Gradient 1.3 GHz and 3.9 GHz Niobium Cavities. Materials. 2024; 17(13):3207. https://doi.org/10.3390/ma17133207
Chicago/Turabian StyleZong, Yue, Jinfang Chen, Dong Wang, Runzhi Xia, Jiani Wu, Zheng Wang, Shuai Xing, Xiaowei Wu, Xuhao He, and Xiaohu Wang. 2024. "Investigation of Electropolishing for High-Gradient 1.3 GHz and 3.9 GHz Niobium Cavities" Materials 17, no. 13: 3207. https://doi.org/10.3390/ma17133207