Tao, J.; Zhao, C.Z.; Zhao, C.; Taechakumput, P.; Werner, M.; Taylor, S.; Chalker, P.R.
Extrinsic and Intrinsic Frequency Dispersion of High-k Materials in Capacitance-Voltage Measurements. Materials 2012, 5, 1005-1032.
https://doi.org/10.3390/ma5061005
AMA Style
Tao J, Zhao CZ, Zhao C, Taechakumput P, Werner M, Taylor S, Chalker PR.
Extrinsic and Intrinsic Frequency Dispersion of High-k Materials in Capacitance-Voltage Measurements. Materials. 2012; 5(6):1005-1032.
https://doi.org/10.3390/ma5061005
Chicago/Turabian Style
Tao, J., C. Z. Zhao, C. Zhao, P. Taechakumput, M. Werner, S. Taylor, and P. R. Chalker.
2012. "Extrinsic and Intrinsic Frequency Dispersion of High-k Materials in Capacitance-Voltage Measurements" Materials 5, no. 6: 1005-1032.
https://doi.org/10.3390/ma5061005
APA Style
Tao, J., Zhao, C. Z., Zhao, C., Taechakumput, P., Werner, M., Taylor, S., & Chalker, P. R.
(2012). Extrinsic and Intrinsic Frequency Dispersion of High-k Materials in Capacitance-Voltage Measurements. Materials, 5(6), 1005-1032.
https://doi.org/10.3390/ma5061005
