Organized Silica Films Generated by Evaporation-Induced Self-Assembly as Hosts for Iron Oxide Nanoparticles
Abstract
:1. Introduction
2. Experimental Section
2.1. Materials
2.2. Substrates for Film Deposition
2.3. Film Preparation Protocol
2.4. Particle Incorporation Methods
2.5. Film Characterization Methods
3. Results and Discussion
3.1. Reference Films without Nanoparticle Guests
Substrate | FTO | Silicon | Glass |
---|---|---|---|
D (out-of-plane) | 139.8 ± 1.3 | 134.0 ± 1.8 | 132.0 ± 1.2 |
D (in-plane) | 124.5 ± 1.8 | 129.1 ± 3.1 | 128.4 ± 2.1 |
3.2. Insertion of Nanoparticles by Co-Precipitation
3.3. Insertion of Iron Oxide Nanoparticles into SiO2/P123 Films Using Impregnation Methods
Sample type | Thickness/μm | Porosity |
---|---|---|
Reference SiO2/P123 film | 0.28 | 0.23 |
Fe@ SiO2/P123—co-precipitation | 0.29 | 0.18 |
Fe@ SiO2/P123—impregnation | Top layer (hematite + voids) = 0.05 | 0.58 |
Bottom layer (silica + voids) = 0.30 | 0.19 |
4. Conclusions
Supplementary Files
Supplementary File 1Acknowledgments
References
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Andreou, I.; Amenitsch, H.; Likodimos, V.; Falaras, P.; Koutsoukos, P.G.; Leontidis, E. Organized Silica Films Generated by Evaporation-Induced Self-Assembly as Hosts for Iron Oxide Nanoparticles. Materials 2013, 6, 1467-1484. https://doi.org/10.3390/ma6041467
Andreou I, Amenitsch H, Likodimos V, Falaras P, Koutsoukos PG, Leontidis E. Organized Silica Films Generated by Evaporation-Induced Self-Assembly as Hosts for Iron Oxide Nanoparticles. Materials. 2013; 6(4):1467-1484. https://doi.org/10.3390/ma6041467
Chicago/Turabian StyleAndreou, Ioanna, Heinz Amenitsch, Vlassis Likodimos, Polycarpos Falaras, Petros G. Koutsoukos, and Epameinondas Leontidis. 2013. "Organized Silica Films Generated by Evaporation-Induced Self-Assembly as Hosts for Iron Oxide Nanoparticles" Materials 6, no. 4: 1467-1484. https://doi.org/10.3390/ma6041467