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Journal: Micromachines, 2021
Volume: 12
Number: 886
Article:
Gate-Stack Engineering to Improve the Performance of 28 nm Low-Power High-K/Metal-Gate Device
Authors:
by
Jeewon Park, Wansu Jang and Changhwan Shin
Link:
https://www.mdpi.com/2072-666X/12/8/886
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