Hermosa, J.; Hierro-RodrÃguez, A.; Quirós, C.; Vélez, M.; Sorrentino, A.; Aballe, L.; Pereiro, E.; Ferrer, S.; MartÃn, J.I.
Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy. Micromachines 2022, 13, 204.
https://doi.org/10.3390/mi13020204
AMA Style
Hermosa J, Hierro-RodrÃguez A, Quirós C, Vélez M, Sorrentino A, Aballe L, Pereiro E, Ferrer S, MartÃn JI.
Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy. Micromachines. 2022; 13(2):204.
https://doi.org/10.3390/mi13020204
Chicago/Turabian Style
Hermosa, Javier, Aurelio Hierro-RodrÃguez, Carlos Quirós, MarÃa Vélez, Andrea Sorrentino, LucÃa Aballe, Eva Pereiro, Salvador Ferrer, and José I. MartÃn.
2022. "Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy" Micromachines 13, no. 2: 204.
https://doi.org/10.3390/mi13020204
APA Style
Hermosa, J., Hierro-RodrÃguez, A., Quirós, C., Vélez, M., Sorrentino, A., Aballe, L., Pereiro, E., Ferrer, S., & MartÃn, J. I.
(2022). Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy. Micromachines, 13(2), 204.
https://doi.org/10.3390/mi13020204
