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Journal: Micromachines, 2022
Volume: 13
Number: 204
Article:
Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy
Authors:
by
Javier Hermosa, Aurelio Hierro-RodrÃguez, Carlos Quirós, MarÃa Vélez, Andrea Sorrentino, LucÃa Aballe, Eva Pereiro, Salvador Ferrer and José I. MartÃn
Link:
https://www.mdpi.com/2072-666X/13/2/204
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