Fabrication of Electrospun Porous TiO2 Dielectric Film in a Ti–TiO2–Si Heterostructure for Metal–Insulator–Semiconductor Capacitors
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Yoo, J.-U.; Choi, T.-M.; Pyo, S.-G. Fabrication of Electrospun Porous TiO2 Dielectric Film in a Ti–TiO2–Si Heterostructure for Metal–Insulator–Semiconductor Capacitors. Micromachines 2024, 15, 1231. https://doi.org/10.3390/mi15101231
Yoo J-U, Choi T-M, Pyo S-G. Fabrication of Electrospun Porous TiO2 Dielectric Film in a Ti–TiO2–Si Heterostructure for Metal–Insulator–Semiconductor Capacitors. Micromachines. 2024; 15(10):1231. https://doi.org/10.3390/mi15101231
Chicago/Turabian StyleYoo, Jin-Uk, Tae-Min Choi, and Sung-Gyu Pyo. 2024. "Fabrication of Electrospun Porous TiO2 Dielectric Film in a Ti–TiO2–Si Heterostructure for Metal–Insulator–Semiconductor Capacitors" Micromachines 15, no. 10: 1231. https://doi.org/10.3390/mi15101231