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Journal: Crystals, 2022
Volume: 12
Number: 1379

Article: Growth of Thin AlN Films on Si Wafers by Reactive Magnetron Sputtering: Role of Processing Pressure, Magnetron Power and Nitrogen/Argon Gas Flow Ratio
Authors: by Matilde Kammer Sandager, Christian Kjelde and Vladimir Popok
Link: https://www.mdpi.com/2073-4352/12/10/1379

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